Temperature dependence of spin injection efficiency in an epitaxially grown Fe/GaAs hybrid structure

被引:4
作者
Lee, Tae Hwan [1 ,2 ]
Koo, Hyun Cheol [1 ]
Kim, Kyung Ho [1 ]
Kim, Hyung-Jun [1 ]
Chang, Joon Yeon [1 ]
Han, Suk-Hee [1 ]
Hong, Jinki [3 ]
Lim, Sang Ho [2 ]
机构
[1] Korea Inst Sci & Technol, Ctr Spintron Res, Seoul 136791, South Korea
[2] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
[3] Korea Univ, Dept Phys, Yeongi Kun 339700, Chungnam, South Korea
关键词
Spin injection; Spin injection efficiency; Interface resistance; Schottky-tunnel-barrier; SEMICONDUCTOR; TRANSPORT; DIFFUSION;
D O I
10.1016/j.jmmm.2009.07.037
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electrical spin injection from Fe into an n-doped GaAs channel through Schottky-tunnel-barrier is observed from 1.8 K to room temperature. The magnitude of local spin valve signal (Delta R/R-0) decreases as the temperature increases. In each temperature, we calculated the injected polarization (eta) considering the spin drift effect induced by the electric field. The interfacial polarizations of 19.3% and 12.6% are acquired for Fe/GaAs junction at T = 1.8 and 300 K, respectively. The temperature dependence of spin injection efficiency is matched with interface resistance variation. As the temperature increases, Schottky-tunnel-barrier property is diminished so that the spin injection efficiency would be reduced. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:3795 / 3798
页数:4
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