Investigation the CuS thin film prepared by pulsed laser deposition

This paper introduces a full study of CuS thin-film deposited on the quartz substrate. Copper sulfide thin films were prepared using the pulsed laser deposition technique and tested before and after the annealing process. The structural, morphological, and optical properties are examined after the deposition process at different energies (500 mJ, 600 mJ, 700 mJ, 800 mJ). The experimental results show that the best optical absorption is achieved at 600 mJ; this value was annealed at different annealing temperatures (300 degrees C, 350 degrees C, 400 degrees C, and 450 degrees C). The effect of thermal annealing on CuS film was examined to find the thickness range and the absorption behavior between 300 and 1100 nm. The average surface roughness was evaluated and discussed according to decrease with an increase in the annealing temperatures. Absorption and AFM results were studied thoroughly. Copper sulfide Film could find applications in optical devices such as surface plasmon resonance, window coatings, and optical gas sensors. (C) 2021 Elsevier Ltd. All rights reserved.