Microlens array fabrication by enhanced thermal reflow process: Towards efficient collection of fluorescence light from microarrays

被引:94
作者
Roy, E. [1 ]
Voisin, B. [1 ,2 ,3 ]
Gravel, J. -F. [2 ,3 ]
Peytavi, R. [4 ]
Boudreau, D. [2 ,3 ]
Veres, T. [1 ]
机构
[1] Natl Res Council Canada, Inst Ind Mat, Boucherville, PQ J4B 6Y4, Canada
[2] Univ Laval, Dept Chim, Quebec City, PQ G1K 7P4, Canada
[3] Univ Laval, Ctr Opt Photon & Laser, Quebec City, PQ G1K 7P4, Canada
[4] Univ Laval, Ctr Rech Infectiol, Ste Foy, PQ G1V 4G2, Canada
关键词
Microlens; Reflow method; Micro optics integration; Microarray fluorescent detection; LITHOGRAPHY SIMULATION; MOLD; ELEMENTS;
D O I
10.1016/j.mee.2009.04.001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper describes two enhanced resist reflow methods for the fabrication of microlens arrays and demonstrates their use for integrated biomolecular fluorescence detection on printed microarrays. A PDMS (polydimethylsiloxane) microlens array was fabricated by a double soft lithography approach using a photoresist microlens array as master mold. Additionally, by using both a careful control of the surface wettability and thermal treatments, we demonstrate the possibility to extend the resist reflow process in order to tune the diameters of microlens array over a large range by using a unique photomask pattern. We introduce an enhanced reflow on hydrophobic surfaces obtained by fluorosilane treatment and identify a threshold shrinkage temperature (T-shrinkage) of 140 degrees C, above which the diameter of microlenses can be then reduced down to 40% compared with the initial pattern on the photomask. Furthermore, on hydrophilic substrates, achieved by an accurate incomplete development of the photoresist, we demonstrate a nearly perfect linear dependency (1.4 mu m/degrees C) of microlens diameter spreading up to 70% the initial diameter inside a temperature reflow window of 110-140 degrees C. For both approaches, above a freezing temperature (T-freezing) of 170 degrees C, the microlens profile characteristics are temperature independent. By using high numerical aperture microlens array, we provide a proof of concept for the integration and enhanced light collection of the fluorescent signals collected form a microarray of fluorescent spots thus showing the potential of the concept for biophotonic integration. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:2255 / 2261
页数:7
相关论文
共 24 条
[1]   CLOSE-UP IMAGING OF DOCUMENTS AND DISPLAYS WITH LENS ARRAYS [J].
ANDERSON, RH .
APPLIED OPTICS, 1979, 18 (04) :477-484
[2]   Study of mechanisms involved in photoresist microlens formation [J].
Audran, S. ;
Faure, B. ;
Mortini, B. ;
Regolini, J. ;
Schlatter, G. ;
Hadziioannou, G. .
MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) :1087-1090
[3]   Lab-on-a-chip with integrated optical transducers [J].
Balslev, S ;
Jorgensen, AM ;
Bilenberg, B ;
Mogensen, KB ;
Snakenborg, D ;
Geschke, O ;
Kutter, JP ;
Kristensen, A .
LAB ON A CHIP, 2006, 6 (02) :213-217
[4]   Variable-focusing microlens with microfluidic chip [J].
Chen, J ;
Wang, WS ;
Fang, J ;
Varahramyan, K .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2004, 14 (05) :675-680
[5]   Microfluidic tunable dye laser with integrated mixer and ring resonator [J].
Galas, JC ;
Torres, J ;
Belotti, M ;
Kou, Q ;
Chen, Y .
APPLIED PHYSICS LETTERS, 2005, 86 (26) :1-3
[6]   Potentiometric platform for the quantification of cellular potassium efflux [J].
Generelli, Silvia ;
Jacquemart, Renaud ;
de Rooij, Nico F. ;
Jolicoeur, Mario ;
Koudelka-Hep, Milena ;
Guenat, Olivier T. .
LAB ON A CHIP, 2008, 8 (07) :1210-1215
[7]   Characterization of a polymer microlens fabricated by use of the hydrophobic effect [J].
Hartmann, DM ;
Kibar, O ;
Esener, SC .
OPTICS LETTERS, 2000, 25 (13) :975-977
[8]   Photoresist characterization for lithography simulation .3. Development parameter measurements [J].
Henderson, CL ;
Tsiartas, PC ;
Pancholi, SN ;
Chowdhury, SA ;
Dombrowski, KD ;
Willson, CG ;
Dammel, RR .
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV, 1997, 3049 :805-815
[9]   Photoresistant characterization for lithography simulation .2. Exposure parameter measurements [J].
Henderson, CL ;
Pancholi, SN ;
Chowdhury, SA ;
Willson, CG ;
Dammel, RR .
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIV, 1997, 3049 :816-828
[10]   Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography [J].
Jung, GY ;
Li, ZY ;
Wu, W ;
Chen, Y ;
Olynick, DL ;
Wang, SY ;
Tong, WM ;
Williams, RS .
LANGMUIR, 2005, 21 (04) :1158-1161