Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers

被引：23

作者：

Hippler, R. ^{[1
]}

Hubicka, Z. ^{[2
]}

Cada, M. ^{[2
]}

Ksirova, P. ^{[2
]}

Wulff, H. ^{[1
]}

Helm, C. A. ^{[1
]}

Stranak, V. ^{[3
]}

机构：

[1] Ernst Moritz Arndt Univ Greifswald, Inst Phys, Felix Hausdorff Str 6, D-17487 Greifswald, Germany

[2] Acad Sci Czech Republ, Inst Phys, na Slovance 2, Prague 18221, Czech Republic

[3] Univ South Bohemia, Fac Sci, Branisovska 31, Ceske Budejovice 37005, Czech Republic

来源：

JOURNAL OF APPLIED PHYSICS | 2017年 / 121卷 / 17期

关键词：

THIN-FILMS; ITO FILMS; DISCHARGE; GROWTH; OXIDE; SURFACE; TARGET; PROBE;

D O I：

10.1063/1.4977823

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Angular distribution measurements have been carried out during High Power Impulse Magnetron Sputtering (HiPIMS) of a titanium target and deposition of titanium and titanium oxide films. The HiPIMS system was operated at a repetition frequency f = 100 Hz with a duty cycle of 1%. Langmuir probe diagnostics has been carried out at a distance of 7.5 cm from the target at four different angles with respect to the surface normal of the target. Film properties were investigated by means of SEM, XR, and GIXD, and a dependence of film thickness and crystalline structure on the deposition angle is observed. Published by AIP Publishing.

引用

页数：9

共 65 条

[1] High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target [J].

Alami, J. ;

Eklund, P. ;

Emmerlich, J. ;

Wilhelmsson, O. ;

Jansson, U. ;

Hogberg, H. ;

Hultman, L. ;

Helmersson, U. .

THIN SOLID FILMS, 2006, 515 (04) :1731-1736

[2] On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering [J].

Alami, J. ;

Sarakinos, K. ;

Uslu, F. ;

Klever, C. ;

Dukwen, J. ;

Wuttig, M. .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2009, 42 (11)

[3] Discharge physics of high power impulse magnetron sputtering [J].

Anders, Andre .

SURFACE & COATINGS TECHNOLOGY, 2011, 205 :S1-S9

[4] A structure zone diagram including plasma-based deposition and ion etching [J].

Anders, Andre .

THIN SOLID FILMS, 2010, 518 (15) :4087-4090

[5] Plasma "anti-assistance" and "self-assistance" to high power impulse magnetron sputtering [J].

Anders, Andre ;

Yushkov, Georgy Yu. .

JOURNAL OF APPLIED PHYSICS, 2009, 105 (07)

[6] Negatively and positively charged oxygen ion formation in collisions of positively charged projectiles with O2 molecules in the energy range 50-350 keV [J].

Angelin, E. J. ;

Hippler, Rainer .

JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 2014, 47 (22)

[7] Thickness effect on properties of titanium film deposited by d.c. magnetron sputtering and electron beam evaporation techniques [J].

Arshi, Nishat ;

Lu, Junqing ;

Lee, Chan Gyu ;

Yoon, Jae Hong ;

Koo, Bon Heun ;

Ahmed, Faheem .

BULLETIN OF MATERIALS SCIENCE, 2013, 36 (05) :807-812

[8] Using Langmuir probes to measure the plasma decay rates in pulsed RF magnetron discharges [J].

Bäcker, H ;

Bradley, JW ;

Kelly, PJ ;

Arnell, RD .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (18) :2709-2714

[9] GROWTH AND EROSION OF THIN SOLID FILMS [J].

BALES, GS ;

BRUINSMA, R ;

EKLUND, EA ;

KARUNASIRI, RPU ;

RUDNICK, J ;

ZANGWILL, A .

SCIENCE, 1990, 249 (4966) :264-268

[10] The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge [J].

Bohlmark, J. ;

Lattemann, M. ;

Gudmundsson, J. T. ;

Ehiasarian, A. P. ;

Gonzalvo, Y. Aranda ;

Brenning, N. ;

Helmersson, U. .

THIN SOLID FILMS, 2006, 515 (04) :1522-1526

← 1 2 3 4 5 6 7 →