Growth rate improvements in the hot-filament CVD deposition of nanocrystalline diamond

被引：48
作者：
Amaral, M.
Fernandes, A. J. S.
Vila, M.
Oliveira, F. J.
Silva, R. F. [1 ]
机构：
[1] Univ Aveiro, CICECO, Ceram & Glass Eng Dept, P-3800 Aveiro, Portugal
[2] Univ Aveiro, Dept Phys, P-3800 Aveiro, Portugal
来源：
DIAMOND AND RELATED MATERIALS | 2006年 / 15卷 / 11-12期
关键词：
nanocrystalline; diamond film; hot filament CVD; morphology;
D O I：
10.1016/j.diamond.2006.07.024
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The hot-filament CVD, a less used technique for NCD films growth using Ar/H-2/CH4 gas mixtures, is optimized for the coating of silicon nitride ceramics. Parameters such as gas composition (Ar/H-2 and CH4/H-2 ratios), total gas pressure, total mass flow and substrate and filament temperatures, are studied to assess their effect on NCD growth kinetics as well as on film quality and morphology. The smallest diamond crystallite sizes (8 nm) were recorded for the slowest growth rate of 0.1 mu m h(-1). A remarkable result is the very high growth rate of 1.6 mu m h(-1) of continuous NCD coatings with 28 nm of crystallite size, obtained in selected deposition conditions. (c) 2006 Elsevier B.V. All rights reserved.
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收藏
页码：1822 / 1827
页数：6
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