Atomic layer deposited (ALD) TiO2 and TiO2-x-Nx thin film photocatalysts in salicylic acid decomposition

被引：14

作者：

Vilhunen, S. H. ^{[1
]}

Sillanpaa, M. E. T. ^{[1
]}

机构：

[1] Univ Kuopio, Lab Appl Environm Chem, Dept Environm Sci, FI-50100 Mikkeli, Finland

来源：

WATER SCIENCE AND TECHNOLOGY | 2009年 / 60卷 / 10期

关键词：

atomic layer deposition; nitrogen-doping; salicylic acid; titanium dioxide; ultraviolet light; TITANIUM-DIOXIDE; PHOTODEGRADATION; DEGRADATION; DEGUSSA; WATER;

D O I：

10.2166/wst.2009.660

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

Degradation of salicylic acid (SA) with thin film photocatalyst, titanium dioxide (TiO2) and nitrogen-doped TiO2 (TiO2-x-N-x) combined with ultraviolet (UV) radiation was studied. TiO2 film with thickness of 15 and 65nm was tested. The TiO2-x-N-x film had thickness of 15nm on top of TiO2 (50 nm). Photocatalysts were prepared on glass substrate by atomic layer deposition (ALD) technique. The effect of initial pH (3-10) was studied with SA concentration of 10 mg/l. Decomposition of SA was fastest at pH 6 with both films and the rate was equal at initial pH values 3 and 4.3. However, at higher pH values the non-doped film was more efficient.

引用

页码：2471 / 2475

页数：5

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