Broad metal ion and plasma beams techniques TAMEK for material surface modification

This paper reviews the development of vacuum are metal ion sources and their application for material surface modification, The versatile, compact (high-voltage power supply and ion gun are located in the 70x40x25 cm(3) space) vacuum are source TAMEK operated in frequency-pulsed mode is capable of generating a large spot area of 300-2000 cm-metal ion beams for ion implantation E-i<200 keV, dD(i)/dt<10(16)ion/cm(2)/min, or deposition dH/dt<50-200 nm/min. If desired, metal ion implantation, deposition, or metal ion beam assisted deposition (IBAD) can be performed without switching off the source. The TAMEK source considerably improves IBAD treatment by means of alternation of the ion implantation and ion deposition and provides coatings both on metals and dielectric materials with deeper mutual mixing at low target temperature and simple surface preparation before treatment. TAMEK-M sources operated in pulsed t=1-5 mu s mode, U-accel<100 kV, I-i<5 kA are used for increasing microhardness in subsurface layers up to 150 mu m in depth after several pulses with, an energy input into the surface dW = 2-5 J/cm(2) This permits the TAMEK-M source to be used for the treatment of precision and small size products, e.g, drills with diameter smaller than 1-3 mm, TAMEK sources can be successfully used in conventional fields of ion implantation and physical vapor deposition, and some TAMEK applications for treatment of metals, ceramics, glass, polymers are also shown, e.g. tools, construction materials, electrical contacts and electrodes, mirrors, etc. (C) 1997 Elsevier Science S.A.