Effect of trace water on the film formation on nickel anode

被引：13

作者：

Tasaka, A

Tsukuda, Y

Ohashi, T

Yamada, S

Matsushita, K

Kohmura, A

Muramatsu, N

Takebayashi, H

机构：

[1] Doshisha University, Faculty of Engineering, Department of Molecular Science and Technology, Tadara, Kyotanabe, Kyoto, 610-03, Miyako-dani

来源：

DENKI KAGAKU | 1997年 / 65卷 / 12期

关键词：

electrochemical fluorination; effect of water; oxide layer; nickel anode; corrosion;

D O I：

10.5796/kogyobutsurikagaku.65.1086

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The effects of trace water in NH4F . 2HF melt at 100 degrees C on the formation rate and the physico-chemical properties of oxidized layer on the Ni anode were studied. The potentiodynamic and potentiostatic polarization behaviors of the Ni anode were investigated to elucidate the anodic processes. The overall anodic current and the current loss caused by nickel dissolution at the potential range higher than 4.75 V were decreased by a trace of water in the melt, presumably due to the formation of dense oxide layer.

引用

页码：1086 / 1090

页数：5

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