Reliability of SiGe HBTs for Power Amplifiers-Part I: Large-Signal RF Performance and Operating Limits

被引:32
作者
Grens, Curtis M. [1 ]
Cheng, Peng [1 ]
Cressler, John D. [1 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
关键词
Avalanche breakdown; bipolar transistors; dynamic stress; mixed-mode stress; power amplifier (PA); reliability; safe-operating area (SOA); SiGe HBTs; BIPOLAR; VOLTAGE;
D O I
10.1109/TDMR.2009.2025029
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper examines the performance and reliability implications associated with aggressively biased cascode SiGe HBT power-amplifier cores under large-signal RF operating conditions. The role of high-power RF stress on device degradation and failure is examined in detail. General expressions for a large-signal RF safe-operating area, which account for the effect of load impedance on the dynamic output current and voltage characteristics, are presented. These show excellent agreement with experimental results. Useful operating guidelines for reliable large-signal operation are provided.
引用
收藏
页码:431 / 439
页数:9
相关论文
共 22 条
[11]   The maximum operating region in SiGeHBTs for RF power amplifiers [J].
Inoue, A ;
Nakatsuka, S ;
Hattori, R ;
Matsuda, Y .
2002 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-3, 2002, :1023-1026
[12]   Self-aligned SiGeNPN transistors with 285 GHz fMAX and 207 GHz fT in a manufacturable technology [J].
Jagannathan, B ;
Khater, M ;
Pagette, F ;
Rieh, JS ;
Angell, D ;
Chen, H ;
Florkey, J ;
Golan, F ;
Greenberg, DR ;
Groves, R ;
Jeng, SJ ;
Johnson, J ;
Mengistu, E ;
Schonenberg, KT ;
Schnabel, CM ;
Smith, P ;
Stricker, A ;
Ahlgren, D ;
Freeman, G ;
Stein, K ;
Subbanna, S .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (05) :258-260
[13]   Silicon-germanium BiCMOS HBT technology for wireless power amplifier applications [J].
Johnson, JB ;
Joseph, AJ ;
Sheridan, DC ;
Maladi, RM ;
Brandt, PO ;
Persson, J ;
Andersson, J ;
Bjorneklett, A ;
Persson, U ;
Abasi, F ;
Tilly, L .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2004, 39 (10) :1605-1614
[14]   COLLECTOR BASE JUNCTION AVALANCHE EFFECTS IN ADVANCED DOUBLE-POLY SELF-ALIGNED BIPOLAR-TRANSISTORS [J].
LU, PF ;
CHEN, TC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (06) :1182-1188
[15]   GaAs power MMIC: A design methodology for reliability. [J].
Muraro, JL ;
Coppel, F ;
Gregoris, G ;
Tizien, PG ;
Roux, JL ;
Graffeuil, J ;
Plana, R .
MICROELECTRONICS AND RELIABILITY, 1997, 37 (10-11) :1651-1654
[16]   Influence of impact-ionization-induced instabilities on the maximum usable output voltage of Si-bipolar transistors [J].
Rickelt, M ;
Rein, HM ;
Rose, E .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (04) :774-783
[17]   A doping concentration-dependent upper limit of the breakdown voltage-cutoff frequency product in Si bipolar transistors [J].
Rieh, JS ;
Jagannathan, B ;
Greenberg, D ;
Freeman, G ;
Subbanna, S .
SOLID-STATE ELECTRONICS, 2004, 48 (02) :339-343
[18]  
Vanhoucke T, 2006, IEEE BIPOL BICMOS, P25
[19]  
Yu CZ, 2005, INT RELIAB PHY SYM, P431
[20]  
YUAN JS, 1994, P I ELECTR ENG CIRCU, V141, P299