机构:
Acrorad Co Ltd, Okinawa Plant, Okinawa, JapanHokkaido Inst Technol, Sapporo, Hokkaido 0068585, Japan
Shiraki, H.
[2
]
机构:
[1] Hokkaido Inst Technol, Sapporo, Hokkaido 0068585, Japan
[2] Acrorad Co Ltd, Okinawa Plant, Okinawa, Japan
来源:
2008 IEEE NUCLEAR SCIENCE SYMPOSIUM AND MEDICAL IMAGING CONFERENCE (2008 NSS/MIC), VOLS 1-9
|
2009年
关键词:
CRYSTALS;
D O I:
暂无
中图分类号:
R8 [特种医学];
R445 [影像诊断学];
学科分类号:
1002 ;
100207 ;
1009 ;
摘要:
The surface recombination velocity of high resistivity CdTe with several different crystallographic orientations of (111), 5 degrees off from (111), 8 degrees off from (311) and (511) has been investigated by using a combination of a "mu tau-model" spectral fitting method and a time-of-flight drift mobility measurement. In the (111) and the 5 degrees off from (111) samples, the Cd face shows higher surface recombination velocity (similar to 6 x 10(5) cm/s) than that of the Te face (similar to 3 x 10(5) cm/s). Away from the polar face toward the (511) face, the difference is less pronounced although not disappeared completely.