Advanced thin film technology for ultrahigh resolution X-ray microscopy

被引：103

作者：

Vila-Comamala, Joan ^{[1
]}

Jefimovs, Konstantins ^{[2
]}

Raabe, Joerg ^{[1
]}

Pilvi, Tero ^{[3
]}

Fink, Rainer H. ^{[4
]}

Senoner, Mathias ^{[5
]}

Maassdorf, Andre ^{[6
]}

Ritala, Mikko ^{[3
]}

David, Christian ^{[1
]}

机构：

[1] Paul Scherrer Inst, CH-5232 Villigen, Switzerland

[2] EMPA, CH-8600 Dubendorf, Switzerland

[3] Univ Helsinki, Dept Chem, FI-00014 Helsinki, Finland

[4] Univ Erlangen Nurnberg, ICMM & IZ ICP, D-91058 Erlangen, Germany

[5] BAM Bundesanstalt Mat Forsch & Prufung, D-12200 Berlin, Germany

[6] Ferdinand Braun Inst Hochstfrequenztech, D-12489 Berlin, Germany

来源：

ULTRAMICROSCOPY | 2009年 / 109卷 / 11期

关键词：

X-ray microscopy; X-ray diffractive optics; Electron-beam lithography; Atomic layer deposition; ATOMIC LAYER DEPOSITION; LATERAL RESOLUTION; ZONE PLATES;

D O I：

10.1016/j.ultramic.2009.07.005

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10nm in width were resolved. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1360 / 1364

页数：5

共 21 条

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