Characteristics of Multi-Quantum-Well Laser Diodes with Surface Electrode Structure Directly Bonded to InP Template on SiO2/Si Substrate

被引:3
作者
Han, Xu [1 ]
Tsushima, Koki [1 ]
Shirai, Takuto [1 ]
Ishizaki, Takahiro [1 ]
Shimomura, Kazuhiko [1 ]
机构
[1] Sophia Univ, Dept Engn & Appl Sci, Tokyo 1028554, Japan
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2021年 / 218卷 / 10期
关键词
direct bonding; InP; SiO2; Si substrates; laser diodes; multi-quantum-well active layers;
D O I
10.1002/pssa.202000767
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The lasing characteristics of separate-confinement-heterostructure multi-quantum-well (SCH-MQW) laser diodes (LDs) grown on InP templates bonded to a SiO2/Si substrate using the hydrophilic bonding method are investigated. The layers of the SCH seven-quantum-well-structured LD are grown by low-pressure metal-organic vapor-phase epitaxy. After the pulsed power supply of a high-mesa waveguide is tested with a surface electrode structure, the LD grown on an InP/SiO2/Si substrate is found to exhibit superior lasing characteristics compared to an LD grown on an InP/Si substrate, and the threshold current density is equivalent to that of a surface-electrode-structured LD grown on an InP substrate. The slope efficiency of the LD grown on the InP/SiO2/Si substrate is compared with that of an LD grown on an InP/Si substrate.
引用
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页数:6
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共 17 条
[1]   Bonding temperature dependence of GaInAsP/InP laser diode grown on hydrophilically directly bonded InP/Si substrate [J].
Aikawa, Masaki ;
Onuki, Yuya ;
Hayasaka, Natsuki ;
Nishiyama, Tetsuo ;
Kamada, Naoki ;
Han, Xu ;
Periyanayagam, Gandhi Kallarasan ;
Uchida, Kazuki ;
Sugiyama, Hirokazu ;
Shimomura, Kazuhiko .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (02)
[2]   III-V layer transfer onto silicon and applications [J].
Di Cioccio, L ;
Jalaguier, E ;
Letertre, F .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2005, 202 (04) :509-515
[3]   Emerging heterogeneous integrated photonic platforms on silicon [J].
Fathpour, Sasan .
NANOPHOTONICS, 2015, 4 (02) :143-164
[4]   Wafer-scale integration of group III-V lasers on silicon using transfer printing of epitaxial layers [J].
Justice, John ;
Bower, Chris ;
Meitl, Matthew ;
Mooney, Marcus B. ;
Gubbins, Mark A. ;
Corbett, Brian .
NATURE PHOTONICS, 2012, 6 (09) :610-614
[5]   Heterogeneous silicon light sources for datacom applications [J].
Liang, Di ;
Kurczveil, Geza ;
Huang, Xue ;
Zhang, Chong ;
Srinivasan, Sudharsanan ;
Huang, Zhihong ;
Seyedi, M. Ashkan ;
Norris, Kate ;
Fiorentino, Marco ;
Bowers, John E. ;
Beausoleil, Raymond G. .
OPTICAL FIBER TECHNOLOGY, 2018, 44 :43-52
[6]   Hybrid Integrated Platforms for Silicon Photonics [J].
Liang, Di ;
Roelkens, Gunther ;
Baets, Roel ;
Bowers, John E. .
MATERIALS, 2010, 3 (03) :1782-1802
[7]   Quantum dot lasers for silicon photonics [Invited] [J].
Liu, Alan Y. ;
Srinivasan, Sudharsanan ;
Norman, Justin ;
Gossard, Arthur C. ;
Bowers, John E. .
PHOTONICS RESEARCH, 2015, 3 (05) :B1-B9
[8]   Growth of GaInAs/InP MQW using MOVPE on directly-bonded InP/Si substrate [J].
Matsumoto, K. ;
Makino, T. ;
Kimura, K. ;
Shimomura, K. .
JOURNAL OF CRYSTAL GROWTH, 2013, 370 :133-135
[9]   Novel integration method for III-V semiconductor devices on silicon platform [J].
Matsumoto, Keiichi ;
Kishikawa, Junya ;
Nishiyama, Tetsuo ;
Onuki, Yuya ;
Shimomura, Kazuhiko .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (11)
[10]   Room-temperature operation of GaInAsP lasers epitaxially grown on wafer-bonded InP/Si substrate [J].
Matsumoto, Keiichi ;
Kishikawa, Junya ;
Nishiyama, Tetsuo ;
Kanke, Tomokazu ;
Onuki, Yuya ;
Shimomura, Kazuhiko .
APPLIED PHYSICS EXPRESS, 2016, 9 (06)