Contribution of HONO sources to the NOx/HOx/O3 chemistry in the polluted boundary layer

被引:143
作者
Aumont, B
Chervier, F
Laval, S
机构
[1] Univ Paris 12, CNRS, UMR 7583, LISA, F-94010 Creteil, France
[2] Univ Paris 07, F-94010 Creteil, France
关键词
nitrous acid; photochemical pollution; pollution model;
D O I
10.1016/S1352-2310(02)00920-2
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The contribution of HONO photolysis to the primary production of OH radicals and the impact of HONO sources to the O-3 and NOx budgets has been investigated using a two-layer box model, Three sources of HONO were considered: direct emissions, heterogeneous production on the ground surface and heterogeneous production on the aerosol surface. We considered two scenarios representing typical urban and polluted rural area and simulations were conducted for both summer and winter conditions. For summertime conditions, HONO sources were found to have a slight impact on the NOx/HOx/O-3 concentration profiles, except for conditions favoring the formation of photochemical pollution episodes where it becomes significant. For wintertime conditions, HONO sources were found to be major contributors to the primary OH production, leading to major changes in the HOx and NOx budget all day long. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:487 / 498
页数:12
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