On mechanisms of defect formation in aluminum crystals bombarded by low-energy heavy ions

被引：1

作者：

Kornich, GV ^{[1
]}

Betz, G

Bazhin, AI

机构：

[1] Zaporozhye State Tech Univ, UA-69063 Zaporozhe, Ukraine

[2] Vienna Tech Univ, Inst Allgemeine Phys, A-1040 Vienna, Austria

[3] Donetsk State Univ, UA-340055 Donetsk, Ukraine

来源：

TECHNICAL PHYSICS LETTERS | 2000年 / 26卷 / 06期

关键词：

D O I：

10.1134/1.1262875

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The mechanisms of formation of vacancies and radiation-induced adsorbed and interstitial atoms in the cascades of atomic collisions induced by 25-, 40- and 50-eV Ar and Xe ions normally incident onto the Al(100) surface at 300 K are discussed within the framework of the molecular dynamics approach. The numbers of bulk and surface vacancies formed in the course of a collision cascade exhibit two maxima in the case of Xe ions and a single maximum in the case of Ar ions. (C) 2000 MAIK "Nauka/Interperiodica".

引用

页码：455 / 457

页数：3

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