Bendable GaN high electron mobility transistors on plastic substrates

被引:79
作者
Lee, Keon Jae
Meitl, Matthew A.
Ahn, Jong-Hyun
Rogers, John A.
Nuzzo, Ralph G.
Kumar, Vipan
Adesida, Ilesanmi
机构
[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Chem, Urbana, IL 61801 USA
[3] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[4] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
[5] Univ Illinois, Micro & Nanotechnol Lab, Urbana, IL 61801 USA
关键词
D O I
10.1063/1.2349837
中图分类号
O59 [应用物理学];
学科分类号
摘要
A procedure for fabricating flexible forms of high electron mobility transistors (HEMTs) supported on plastic substrates is described. The process uses a combination of conventional top-down, wafer scale fabrication protocols to define a printable form of ultrathin, device quality multilayer AlGaN/GaN single crystalline microstructures-a so-called microstructured semiconductor ink-and soft-lithographic printing methods to effect their registered transfer to a plastic substrate. These procedures yield high performance, bendable HEMT arrays that are mechanically durable-ones with effective transconductances exceeding nearly all reported forms of printed thin-film transistors. (c) 2006 American Institute of Physics.
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页数:4
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共 27 条
  • [1] High-performance thin-film transistors using semiconductor nanowires and nanoribbons
    Duan, XF
    Niu, CM
    Sahi, V
    Chen, J
    Parce, JW
    Empedocles, S
    Goldman, JL
    [J]. NATURE, 2003, 425 (6955) : 274 - 278
  • [2] The path to ubiquitous and low-cost organic electronic appliances on plastic
    Forrest, SR
    [J]. NATURE, 2004, 428 (6986) : 911 - 918
  • [3] Gil B., 1998, Group III nitride semiconductor compounds: physics and applications
  • [4] GOLIO JM, 1991, MICROWAVE MESFETS HE, P58
  • [5] Horowitz G, 1998, ADV MATER, V10, P365, DOI 10.1002/(SICI)1521-4095(199803)10:5<365::AID-ADMA365>3.0.CO
  • [6] 2-U
  • [7] III-nitrides: Growth, characterization, and properties
    Jain, SC
    Willander, M
    Narayan, J
    Van Overstraeten, R
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (03) : 965 - 1006
  • [8] VERTICAL ETCHING OF SILICON AT VERY HIGH ASPECT RATIOS
    KENDALL, DL
    [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1979, 9 : 373 - 403
  • [9] KHAN MA, 1993, APPL PHYS LETT, V63, P1214, DOI 10.1063/1.109775
  • [10] A stretchable form of single-crystal silicon for high-performance electronics on rubber substrates
    Khang, DY
    Jiang, HQ
    Huang, Y
    Rogers, JA
    [J]. SCIENCE, 2006, 311 (5758) : 208 - 212