25 nm pitch comparison between a traceable x-ray diffractometer and a metrological atomic force microscope

被引：18

作者：

Misumi, Ichiko ^{[1
]}

Kitta, Jun-ichiro ^{[2
]}

Fujimoto, Hiroyuki ^{[1
]}

Gonda, Satoshi ^{[1
]}

Azuma, Yasushi ^{[1
]}

Maeda, Keisuke ^{[2
]}

Kurosawa, Tomizo ^{[2
]}

Ito, Yoshiyasu ^{[3
]}

Omote, Kazuhiko ^{[3
]}

Nakayama, Yoshinori ^{[4
]}

Kawada, Hiroki ^{[5
]}

机构：

[1] NMIJ, Natl Inst Adv Ind Sci & Technol AIST, Tsukuba, Ibaraki 3058563, Japan

[2] Japan Qual Assurance Org JQA, Tokyo 1578573, Japan

[3] Rigaku Corp, Tokyo 1968666, Japan

[4] Hitachi Ltd, Cent Res Lab, Tokyo 1858601, Japan

[5] Hitachi High Technol Corp, Hitachinaka, Ibaraki 3128504, Japan

来源：

MEASUREMENT SCIENCE AND TECHNOLOGY | 2012年 / 23卷 / 01期

关键词：

1D grating; comparison; x-ray diffractometer; metrological AFM; pitch calibration; traceability; SCANNING-ELECTRON-MICROSCOPE; LASER DIFFRACTOMETER; CALIBRATION; ACCURATE; AFM;

D O I：

10.1088/0957-0233/23/1/015002

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A one-dimensional grating (1D grating) is one of the most important reference standards to calibrate nanometrological instruments, such as a critical dimension scanning electron microscope. Recently, the resolutions of nanometrological instruments have become higher, and 1D grating standards with smaller pitches are required. Based on this demand, 1D gratings with 25 nm pitch consisting of Si/SiO2 multilayer thin-film structures have been developed. Furthermore, pitch calibrations using metrological atomic force microscopes (metrological AFMs) and an x-ray diffractometer have been applied. In this study, the results of a 25 nm pitch comparison between a length-and-angle-standards-traceable x-ray diffractometer and a metrological AFM are reported.

引用

页数：15

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