共 50 条
- [2] Fundamentals of Slurry Design for CMP of Metal and Dielectric Materials MRS Bulletin, 2002, 27 : 752 - 760
- [3] Studies on Slurry Design Fundamentals for Advanced CMP Applications CMP CHEMICAL MECHANICAL POLISHING 12, 2013, 50 (39): : 29 - 33
- [5] Fundamentals and applications of spectroscopic ellipsometry (vol 25, pg 794, 2002) QUIMICA NOVA, 2002, 25 (6A): : 1050 - 1050