Light to Shape the Future: From Photolithography to 4D Printing

被引:172
作者
del Barrio, Esus [1 ,2 ]
Sanchez-Somolinos, Carlos [3 ,4 ]
机构
[1] Univ Zaragoza, CSIC, ICMA, Fac Ciencias,Dept Quim Organ, E-50009 Zaragoza, Spain
[2] Univ Zaragoza, Inst Univ Invest Nanociencia Aragon, Zaragoza 50018, Spain
[3] Univ Zaragoza, CSIC, ICMA, Fac Ciencias,Dept Fis Mat Condensada, E-50009 Zaragoza, Spain
[4] CIBER BBN, Madrid 28029, Spain
关键词
photochemical reactions; photosensitive materials; polymeric materials; structuring techniques; PHOTO-CROSS-LINKING; LASER-SCANNING LITHOGRAPHY; NEMATIC LIQUID-CRYSTALS; 2-PHOTON POLYMERIZATION; NANOIMPRINT LITHOGRAPHY; PHASE-TRANSITION; BLOCK-COPOLYMERS; DEFECT-FREE; PHOTODEGRADABLE MACROMERS; PHOTOINDUCED ALIGNMENT;
D O I
10.1002/adom.201900598
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Over the last few decades, the demand of polymeric structures with well-defined features of different size, dimension, and functionality has increased from various application areas, including microelectronics, biotechnology, tissue engineering, and photonics, among others. The ability of light to control over space and time physicochemical processes is a unique tool for the structuring of polymeric materials, opening new avenues for technological progress in different fields of application. This article gives an overview of various photochemical reactions in polymers, photosensitive materials, and structuring techniques making use of light, and highlights most recent advances, emerging opportunities, and relevant applications.
引用
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页数:33
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