Sub-40 nm polymer dot arrays by self-organized dewetting of electron beam treated ultrathin polymer films

被引：13

作者：

Verma, Ankur

Sharma, Ashutosh ^{[1
]}

机构：

[1] Indian Inst Technol Kanpur, Dept Chem Engn, Kanpur 208016, Uttar Pradesh, India

来源：

RSC ADVANCES | 2012年 / 2卷 / 06期

关键词：

THIN LIQUID-FILMS; INSTABILITY; FABRICATION; SOLVENT; LITHOGRAPHY; MORPHOLOGY;

D O I：

10.1039/c2ra00956k

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Sub-40 nm size ordered nanodroplet arrays of polystyrene are fabricated by a low dose selective electron beam exposure of an ultrathin polymer film followed by its intensified self organized dewetting under a mixture of water and polar organic solvents. The self organization speeds up patterning and reduces the feature size, both by more than 10 times.

引用

页码：2247 / 2249

页数：3

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