Sub-40 nm polymer dot arrays by self-organized dewetting of electron beam treated ultrathin polymer films

Sub-40 nm size ordered nanodroplet arrays of polystyrene are fabricated by a low dose selective electron beam exposure of an ultrathin polymer film followed by its intensified self organized dewetting under a mixture of water and polar organic solvents. The self organization speeds up patterning and reduces the feature size, both by more than 10 times.