A glance of technology efforts for design-for-manufacturing in nano-scale CMOS processes

被引：4

作者：

Cheng YuHua ^{[1
]}

机构：

[1] Peking Univ, Shanghai Res Inst Microelect SHRIME, Shanghai 201203, Peoples R China

来源：

SCIENCE IN CHINA SERIES F-INFORMATION SCIENCES | 2008年 / 51卷 / 06期

基金：

中国国家自然科学基金;

关键词：

design-for-manufacturing (DFM); design-for-yield; nano-CMOS IC design; IC design methodology; CMOS design technology platform;

D O I：

10.1007/s11432-008-0054-9

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

This paper overviews design for manufacturing (DFM) for IC design in nano-CMOS technologies. Process/device issues relevant to the manufacturability of ICs in advanced CMOS technologies will be presented first before an exploration on process/device modeling for DFM is done. The discussion also covers a brief introduction of DFM-aware of design flow and EDA efforts to better handle the design-manufacturing interface in very large scale IC design environment.

引用

页码：807 / 818

页数：12

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