ORMOSIL thin films: Tuning mechanical properties via a nanochemistry approach

被引：25

作者：

Palmisano, Giovanni

Le Bourhis, Eric

Ciriminna, Rosaria

Tranchida, Davide

Pagliaro, Mario

机构：

[1] CNR, Ist Studio Mat Nanostrutturati, I-90146 Palermo, Italy

[2] Univ Poitiers, CNRS, UMR 6630, Met Phys Lab, F-86962 Futuroscope, France

[3] Univ Palermo, Dipartimento Ingn Chim Proc & Mat, I-90128 Palermo, Italy

来源：

LANGMUIR | 2006年 / 22卷 / 26期

关键词：

D O I：

10.1021/la061520w

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The mechanical properties ( hardness and elastic modulus) of organically modified silicate thin films can be finely tuned by varying the degree of alkylation and thus the fraction of six- and four-membered siloxane rings in the organosilica matrix. This opens the way to large tunability of parameters that are of crucial practical importance for films that are finding increasing application in numerous fields ranging from microelectronics to chemical sensing.

引用

页码：11158 / 11162

页数：5

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