Structural and optical properties of stacked self-assembled InAs/InGaAs quantum dots on graded Si1-xGex/Si substrate

被引:11
|
作者
Tanoto, H. [1 ]
Yoon, S. F. [1 ,2 ]
Ngo, C. Y. [1 ]
Loke, W. K. [1 ]
Dohrman, C. [3 ]
Fitzgerald, E. A. [3 ,4 ]
Narayanan, B. [5 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[2] Singapore MIT Alliance, Singapore 637460, Singapore
[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[4] Singapore MIT Alliance, Cambridge, MA 02139 USA
[5] Inst Microelect, Singapore 117685, Singapore
关键词
D O I
10.1063/1.2931699
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the effects of InAs monolayer coverage on the structural and optical characteristics of stacked InAs quantum dot (QD) layers on graded Si-1 (-) Ge-x(x)/Si substrate. No preferential InAs QDs nucleation was observed along the cross-hatched lines on the graded Si-1 (-) Ge-x(x)/Si substrate. Employing alternate-beam molecular beam epitaxy, InAs QDs with areal density as high as 7x10(10) cm(-2) was achieved. Temperature dependence of the InAs QDs optical properties is discussed. The InAs QDs show room-temperature photoluminescence at 1.3 mu m with full width at half-maximum of 65 nm. The results are significant for potential realization of III-V QD devices on silicon-based platforms. (c) 2008 American Institute of Physics.
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页数:3
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