共 28 条
Bias-Dependence of Electroluminescence in AlGaN/GaN High-Electron-Mobility Transistors on SiC Substrate
被引:1
作者:

Ma, Qiang
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Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan

Urano, Shiyo
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Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan

Tanaka, Atsushi
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Nagoya Univ, Inst Mat & Syst Sustainabil, Nagoya, Aichi 4648601, Japan
Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan

Ando, Yuji
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Nagoya Univ, Dept Elect, Nagoya, Aichi 4648601, Japan Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan

Wakejima, Akio
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Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan
机构:
[1] Nagoya Inst Technol, Grad Sch Engn, Tsukuri Coll, Nagoya, Aichi 4668555, Japan
[2] Nagoya Univ, Inst Mat & Syst Sustainabil, Nagoya, Aichi 4648601, Japan
[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
[4] Nagoya Univ, Dept Elect, Nagoya, Aichi 4648601, Japan
关键词:
HEMTs;
Logic gates;
Wide band gap semiconductors;
Aluminum gallium nitride;
Electric fields;
Silicon carbide;
Substrates;
GaN;
HEMT;
electroluminescence;
electron trap;
current collapse;
electric field;
FIELD DISTRIBUTION;
CURRENT COLLAPSE;
IMPACT;
PASSIVATION;
PLATE;
D O I:
10.1109/JEDS.2022.3163379
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
This paper investigates bias-dependence of electroluminescence (EL) in an AlGaN/GaN HEMT fabricated on a SiC substrate. The HEMT exhibited a low-intensity reddish EL at the gate electrode at a drain voltage (V-ds) of 30 V, which was confirmed with combination of a top-side view using a CMOS sensor camera and a back-side view using a silicon-intensified CCD. As V-ds was increased to 48 V, color change from low-intensity red to high-intensity white was accompanied with shift of the location from the gate to the drain edge. The changes in the EL are attributed to a shift of the high electric field from the gate to the drain electrode and a concentration of electric field near the drain edge.
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页码:297 / 300
页数:4
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