Characterization of Palladium thin film deposited by pulsed laser deposition

被引:0
作者
Singh, Udaibir [1 ]
Jha, Nisha [2 ]
Kapoor, Avinashi [2 ]
机构
[1] Univ Delhi, Acharya Narendra Dev Coll, Dept Elect, New Delhi 110019, India
[2] Univ Delhi, Dept Elect, New Delhi 110021, India
来源
INTERNATIONAL CONFERENCE ON APPLICATIONS OF OPTICS AND PHOTONICS | 2011年 / 8001卷
关键词
Palladium; Thin films; Pulsed laser deposition; Substrate temperature; SWITCHABLE MIRRORS; ELECTRONIC-PROPERTIES; OPTICAL-TRANSMISSION; KINETICS;
D O I
10.1117/12.890863
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper the crystalline and morphological properties of Pd thin films deposited on glass substrate by pulsed laser deposition (PLD) technique at different substrate temperatures have been investigated. These films were deposited with an excimer (XeCl) laser source (lambda= 308 nm, pulse duration of 30 ns, repetition rate of 10 Hz). The fabricated films were characterized by various methods such as X-ray diffraction (XRD) and atomic force microscopy (AFM). The thickness and refractive index of samples were measured using ellipsometry. There was influence of substrate temperature on the surface roughness of thin film. The rms roughness increases with increasing temperature. As the temperature increase the crystallinity of the film also increases.
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页数:7
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