Multifold improvement of thermoelectric power factor by tuning bismuth and antimony in nanostructured n-type bismuth antimony telluride thin films

被引:72
作者
Murmu, Peter P. [1 ]
Kennedy, John [1 ,2 ,3 ]
Suman, Sidharth [1 ]
Chong, Shen V. [2 ,4 ]
Leveneur, Jerome [1 ]
Storey, James [2 ,4 ]
Rubanov, Sergey [5 ]
Ramanath, Ganpati [6 ]
机构
[1] GNS Sci, Natl Isotope Ctr, POB 31312, Lower Hutt 5010, New Zealand
[2] MacDiarmid Inst Adv Mat & Nanotechnol, Wellington, New Zealand
[3] SRM Univ, Dept Phys & Nanotechnol, Madras 603203, Tamil Nadu, India
[4] Victoria Univ Wellington, Robinson Res Inst, POB 33436, Lower Hutt 5046, New Zealand
[5] Univ Melbourne, Bio21 Inst, Melbourne, Vic 3010, Australia
[6] Rensselaer Polytech Inst, Mat Sci & Engn Dept, Troy, NY 12180 USA
关键词
Thermoelectric; Bismuth antimony telluride; N-type; Power factor; Thin film; PERFORMANCE; GROWTH; TEMPERATURE;
D O I
10.1016/j.matdes.2018.107549
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bismuth telluride (Bi2Te3) based alloys are preferred thermoelectric materials for room temperature thermoelectric applications. Electrical transport and thermopower properties of n-type nanostructured BixSb2-xTe3 films were tuned by post-growth heat treatment. We report that annealing of sputter-deposited nanostructured Bi0.7Sb1.3Te3 films lead to several-fold increases in thermoelectric power factor alpha(2)sigma, where sigma is electronic conductivity and alpha is Seebeck coefficient. Annealing at T-anneal = 200 degrees C nearly quadruples the power factor to alpha(2)sigma = 3.1 mu Wcm(-1) K-2. Spectroscopy and microscopy analyses indicate that the power factor increase is attributable to similar to 50% decrease in the Bi/Sb ratio, and grain growth, which increase the charge carrier concentration and mobility. The observed Bi depletion is contrary to annealing-induced Te depletion reported in p-type films. For T-anneal >200 degrees C, although continued Bi depletion increases sigma s, a precipitous decrease in alpha sharply lowers the power factor, yielding tenfold lower alpha(2)sigma for T-anneal = 400 degrees C than the as-deposited films. Our findings indicate that post-deposition annealing is a potent way to tune the thermoelectric properties of n-type Bi2Te3-based alloy films to fabricate devices for high-efficiency solid-state refrigeration and power harvesting from waste heat. (c) 2018 Elsevier Ltd.
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页数:7
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