Visible-Light-Curable Solvent-Free Acrylic Pressure-Sensitive Adhesives via Photoredox-Mediated Radical Polymerization

被引:20
作者
Back, Jong-Ho [1 ]
Kwon, Yonghwan [2 ,3 ]
Kim, Hyun-Joong [4 ]
Yu, Youngchang [1 ]
Lee, Wonjoo [1 ]
Kwon, Min Sang [2 ]
机构
[1] Korea Res Inst Chem Technol, Ctr Adv Specialty Chem, Ulsan 44412, South Korea
[2] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
[3] Ulsan Natl Inst Sci & Technol UNIST, Dept Mat Sci & Engn, Ulsan 44919, South Korea
[4] Seoul Natl Univ, Res Inst Agr & Life Sci, Dept Agr Forestry & Bioresources, Coll Agr & Life Sci, Seoul 08826, South Korea
来源
MOLECULES | 2021年 / 26卷 / 02期
基金
新加坡国家研究基金会;
关键词
acrylic pressure-sensitive adhesive; visible-light curing; photocatalysis; α -haloester;
D O I
10.3390/molecules26020385
中图分类号
Q5 [生物化学]; Q7 [分子生物学];
学科分类号
071010 ; 081704 ;
摘要
Owing to their excellent properties, such as transparency, resistance to oxidation, and high adhesivity, acrylic pressure-sensitive adhesives (PSAs) are widely used. Recently, solvent-free acrylic PSAs, which are typically prepared via photopolymerization, have attracted increasing attention because of the current strict environmental regulations. UV light is commonly used as an excitation source for photopolymerization, whereas visible light, which is safer for humans, is rarely utilized. In this study, we prepared solvent-free acrylic PSAs via visible light-driven photoredox-mediated radical polymerization. Three alpha-haloesters were used as additives to overcome critical shortcomings, such as the previously reported low film curing rate and poor transparency observed during additive-free photocatalytic polymerization. The film curing rate was greatly increased in the presence of alpha-haloesters, which lowered the photocatalyst loadings and, hence, improved the film transparency. These results confirmed that our method could be widely used to prepare general-purpose solvent-free PSAs-in particular, optically clear adhesives for electronics.
引用
收藏
页数:12
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