Calculated cross sections for electron collisions with NF3, NF2 and NF with applications to remote plasma sources

被引:53
作者
Hamilton, James R. [1 ]
Tennyson, Jonathan [1 ]
Huang, Shuo [2 ]
Kushner, Mark J. [2 ]
机构
[1] UCL, Dept Phys & Astron, Gower St, London WC1E 6BT, England
[2] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
关键词
molecular data; electron collisions; etching plasma; LOW-ENERGY-ELECTRON; IMPACT IONIZATION; MOLECULES; SCATTERING; STATES; SYSTEM; CFX;
D O I
10.1088/1361-6595/aa6bdf
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Electron impact cross sections sets are constructed for the nitrogen trifluoride, nitrogen difluoride and nitrogen monofluoride molecules. These cross sections are based on ab initio R-matrix calculations augmented by other procedures. Cross sections are presented for elastic collisions, momentum transfer, dissociative electron attachment, electron impact dissociation, ionisation and dissociative ionisation. For NF process occurring via the metastable a (1)Delta and b (1)Sigma(+) states are also considered. A semi-empirical method of estimating the products of electron impact ionisation is proposed and tested for ammonia. The cross sections are extended to high energy where appropriate. The cross section set constructed is tested in a global model simulation of a low pressure, inductively coupled plasma based on a Ar/NF3/O-2 initial gas mixture.
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页数:16
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