Modification of Fluorinated Al2O3 Surface by Irradiating H2 and O2 Plasmas

被引：1
|
作者：
Miwa, Kazuhiro [1 ]
Usami, Kenji [1 ]
Takada, Noriharu [1 ]
Sasaki, Koichi [2 ]
机构：
[1] Nagoya Univ, Dept Elect Engn & Comp Sci, Nagoya, Aichi 4648603, Japan
[2] Nagoya Univ, Plasma Nanotechnol Res Ctr, Nagoya, Aichi 4648603, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2009年 / 48卷 / 12期
关键词：
REACTION-PRODUCTS; ALUMINUM; WALLS; ADSORPTION; REDUCTION; SPECTRA;
D O I：
10.1143/JJAP.48.126002
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We irradiated H-2 and O-2 plasmas onto fluorinated Al2O3, which was prepared by exposing a virgin Al2O3 sample to an SF6/O-2 plasma. The effects of the H-2 plasma irradiation were the reduction of the AIO(x)F(y) (x + y = 1.5) and AIF(x) (x < 3) bonding components and the realization of smooth sample surface. It was observed that the irradiation of the H-2 plasma induced AI-OH bonding. The AI-OH bonding was removed by the sequential irradiation of the O-2 plasma after the H-2 plasma irradiation. The O-2 plasma irradiation also resulted in peroxidation and an increase in surface roughness. (C) 2009 The Japan Society of Applied Physics
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页数：5
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