Extreme Ultraviolet Radiation Source Based on a Discharge Sustained by a Radiation Pulse from a Terahertz Free-Electron Laser

被引:4
作者
Abramov, I. S. [1 ,2 ]
Gospodchikov, E. D. [1 ]
Shalashov, A. G. [1 ]
机构
[1] Russian Acad Sci, Inst Appl Phys, Nizhnii Novgorod 603950, Russia
[2] Lobachevsky State Univ Nizhny Novgorod, Nizhnii Novgorod 603950, Russia
基金
俄罗斯基础研究基金会;
关键词
MULTIPLY-CHARGED IONS; CROSS-SECTIONS; PLASMA; XE;
D O I
10.1134/S1063776121020096
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We consider the possibility of sustaining a discharge in xenon efficiently emitting light in a wavelength range of 11.2 nm +/- 1% by a subnanosecond terahertz radiation pulse. We have simulated such a discharge for parameters typical of experiments using modern free-electron lasers as a source of a high-intensity terahertz radiation. It is shown that a NovoFEL-3 modernized free-electron laser at the Budker Institute will allow to sustain a point-like plasma discharge with a density of excited Xe10+-Xe11+ ions sufficient for the yield of extreme ultraviolet radiation with an average power of 35 W in a wavelength range of 11.2 nm +/- 1%.
引用
收藏
页码:223 / 232
页数:10
相关论文
共 36 条
[1]   Extreme-Ultraviolet Light Source for Lithography Based on an Expanding Jet of Dense Xenon Plasma Supported by Microwaves [J].
Abramov, I. S. ;
Gospodchikov, E. D. ;
Shalashov, A. G. .
PHYSICAL REVIEW APPLIED, 2018, 10 (03)
[2]   Prospects of extreme ultraviolet radiation sources based on microwave discharge for high-resolution lithography [J].
Abramov, I. S. ;
Gospodchikov, E. D. ;
Shalashov, A. G. .
PHYSICS OF PLASMAS, 2017, 24 (07)
[3]  
[Anonymous], 1990, PHYS ENCY
[4]  
[Anonymous], 2020, TABLE PARAMETERS IRT
[5]  
[Anonymous], 2015, RADIOFIZ
[7]  
Bakshi V., 2018, EUV Lithography, V2, DOI [10.1117/3.2305675, DOI 10.1117/3.2305675]
[8]  
Biberman L.M., 1987, KINETICS NONEQUILIBR
[9]   Large-Orbit Gyrotron Operation in the Terahertz Frequency Range [J].
Bratman, V. L. ;
Kalynov, Yu. K. ;
Manuilov, V. N. .
PHYSICAL REVIEW LETTERS, 2009, 102 (24)
[10]   Conversion efficiency of a laser-plasma source based on a Xe jet in the vicinity of a wavelength of 11 nm [J].
Chkhalo, N. I. ;
Garakhin, S. A. ;
Lopatin, A. Ya. ;
Nechay, A. N. ;
Pestov, A. E. ;
Polkovnikov, V. N. ;
Salashchenko, N. N. ;
Tsybin, N. N. ;
Zuev, S. Yu. .
AIP ADVANCES, 2018, 8 (10)