X-ray irradiation and bias effects in fully-depleted and partially-depleted SiGeHBTs fabricated on CMOs-compatible SOI

被引:13
作者
Bellini, Marco [1 ]
Jun, Bongim
Chen, Tianbing
Cressler, John D.
Marshall, Paul W.
Chen, Dakai
Schrimpf, Ronald D.
Fleetwood, Daniel M.
Cai, Jin
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[2] NASA, Goddard Space Flight Ctr, Greenbelt, MD 20771 USA
[3] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37232 USA
[4] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
heterojunction bipolar transistors; radiation effects; SiGeHBT; silicon-on-insulator technology; SOI; TCAD;
D O I
10.1109/TNS.2006.885795
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
X-ray total ionizing dose effects in both fully-depleted and partially-depleted SiGe HBT-on-SOI transistors are investigated at room and at cryogenic temperatures for the first time. Devices irradiated in grounded and forward-active mode configurations exhibit a different behavior depending on the collector doping of the device. The degradation produced by 10 keV x-rays is compared to previously reported 63 MeV proton results on the same fully-depleted SiGe HBT-on-SOI devices, showing decreased degradation for proton irradiation. Both collector and substrate bias are shown to affect the two-dimensional nature of the current flow in these devices, resulting in significant differences in the avalanche multiplication characteristics (hence, breakdown voltage) across temperature.
引用
收藏
页码:3182 / 3186
页数:5
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