Ultrathin chromium oxide films on the W(100) surface

被引：13
作者：
Guo, DH
Guo, QL [1 ]
Altman, MS
Wang, EG
机构：
[1] Chinese Acad Sci, Inst Phys, State Key Lab Surface Phys, Beijing 100080, Peoples R China
[2] Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China
来源：
JOURNAL OF PHYSICAL CHEMISTRY B | 2005年 / 109卷 / 44期
关键词：
D O I：
10.1021/jp054460w
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Ultrathin chromium oxide films were prepared on a W(100) surface under ultrahigh-vacuum conditions and investigated in situ by X-ray photoelectron spectroscopy, ultraviolet photoelectron spectroscopy, and low-energy electron diffraction. The results show that, at Cr coverage of less than 1 monolayer, CrO2 is formed by oxidizing pre-deposited Cr at 300-320 K in similar to 10(-7) mbar oxygen. However, an increase of temperature causes formation of Cr2O3. At Cr coverage above I monolayer, only Cr2O3 is detected.
引用
收藏
页码：20968 / 20972
页数：5
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