High-accuracy interferometry of extreme ultraviolet lithographic optical systems

被引：9

作者：

Goldberg, KA ^{[1
]}

Naulleau, P

Lee, S

Bresloff, C

Henderson, C

Attwood, D

Bokor, J

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Dept EECS, Berkeley, CA 94720 USA

[3] Sandia Natl Labs, Livermore, CA USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.590498

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Recent improvements in extreme ultraviolet (EUV) lithographic imaging with Schwarzschild objectives have come as a direct result of at-wavelength interferometric characterization with the phase-shifting point diffraction interferometer. High accuracy system wave front characterization has led to the determination of the best Schwarzschild objective and subaperture configuration. These investigations and the results of imaging experiments are discussed. Two pinhole null tests have provided an in situ method of demonstrating reference wavefront accuracy of similar to lambda(EUV)/300.

引用

页码：3435 / 3439

页数：5

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