Toluene concentration using honeycomb nonthermal plasma desorption

被引:44
作者
Kuroki, Tomoyuki [1 ]
Fujioka, Takeshi [1 ]
Okubo, Masaaki [1 ]
Yamamoto, Toshiaki [1 ]
机构
[1] Osaka Prefecture Univ, Dept Mech Engn, Sakai, Osaka 5998531, Japan
关键词
nonthermal plasma; desorption; honeycomb; toluene; concentration;
D O I
10.1016/j.tsf.2006.02.091
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In general, the gas concentration of volatile organic compounds (VOCs) is low (in ppm levels) and the gas volume is large, for example, the indoor exhaust gas flow rate and VOCs concentration from a certain printing factory are 800 Nm(3)/min and 17 ppm, respectively. Therefore, it is expensive and ineffective to treat them directly. For these exhausts, the gas treatment system combined the gas concentrating technology using absorbent material is extremely effective. The conventional desorption processes use thermal desorption method and pressure swing adsorption method. In the present study, we focused on toluene which is a typical matter among VOCs. The toluene concentration using the plasma desorption and the honeycomb-type absorbent material which is used in the conventional thermal desorption process was investigated in order to achieve higher concentration efficiency and make the treatment equipment smaller in size than the conventional equipment. Also, the effects of background gas, flow direction and flow rate in the desorption process were demonstrated. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:4272 / 4277
页数:6
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共 15 条
  • [1] PARAMETRIC STUDIES ON CO2 SEPARATION AND RECOVERY BY A DUAL REFLUX PSA PROCESS CONSISTING OF BOTH RECTIFYING AND STRIPPING SECTIONS
    DIAGNE, D
    GOTO, M
    HIROSE, T
    [J]. INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 1995, 34 (09) : 3083 - 3089
  • [2] Photocatalytic oxidation of benzene in air
    Einaga, H
    Ibusuki, T
    Futamura, S
    [J]. JOURNAL OF SOLAR ENERGY ENGINEERING-TRANSACTIONS OF THE ASME, 2004, 126 (02): : 789 - 793
  • [3] Destruction of volatile organic compounds used in a semiconductor industry by a capillary tube discharge reactor
    Kohno, H
    Berezin, AA
    Chang, JS
    Tamura, M
    Yamamoto, T
    Shibuya, A
    Hondo, S
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 1998, 34 (05) : 953 - 966
  • [4] Decomposition of dilute trichloroethylene by nonthermal plasma processing - Gas flow rate, catalyst, and ozone effect
    Oda, T
    Yamaji, K
    Takahashi, T
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2004, 40 (02) : 430 - 436
  • [5] Nonthermal plasma processing for dilute VOCs decomposition
    Oda, T
    Takahahshi, T
    Yamaji, K
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2002, 38 (03) : 873 - 878
  • [6] Decomposition of benzene using alumina-hybrid and catalyst-hybrid plasma reactors
    Ogata, A
    Yamanouchi, K
    Mizuno, K
    Kushiyama, S
    Yamamoto, T
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 1999, 35 (06) : 1289 - 1295
  • [7] Removal of dilute benzene using a zeolite-hybrid plasma reactor
    Ogata, A
    Ito, D
    Mizuno, K
    Kushiyama, S
    Yamamoto, T
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2001, 37 (04) : 959 - 964
  • [8] Effect of zeolite in surface discharge plasma on the decomposition of toluene
    Oh, SM
    Kim, HH
    Ogata, A
    Einaga, H
    Futamura, S
    Park, DW
    [J]. CATALYSIS LETTERS, 2005, 99 (1-2) : 101 - 104
  • [9] NOX reduction aftertreatment system using nitrogen nonthermal plasma desorption
    Okubo, M
    Inoue, M
    Kuroki, T
    Yamamoto, T
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2005, 41 (04) : 891 - 899
  • [10] NOx concentration using adsorption and nonthermal plasma desorption
    Okubo, M
    Tanioka, G
    Kuroki, T
    Yamamoto, T
    [J]. IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2002, 38 (05) : 1196 - 1203