Diffusion in amorphous NiZrAl alloys

被引：10

作者：

Flege, S

Fecher, U

Hahn, H

机构：

[1] Darmstadt Univ Technol, Dept Mat Sci, Div Thin Film, D-64287 Darmstadt, Germany

[2] Vacuumschmelze GmbH, D-63412 Hanau, Germany

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2000年 / 270卷 / 1-3期

关键词：

D O I：

10.1016/S0022-3093(00)00079-X

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Tracer diffusion coefficients for large and small sized impurities were measured in the bulk metallic glass NixZryAlz for several compositions. Molecular beam deposition was employed to grow thin films and secondary ion mass spectrometry was used to determine the concentration-depth profiles of several tracers. A dependence of the atomic mobility of the tracer on its size was found, as observed in the binary NixZry amorphous alloy system. The presence of the Al reduces the diffusion coefficients in general, with a stronger decrease for the small sized tracer. The results support the existence of two different diffusion mechanisms proposed for amorphous metallic alloys. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：123 / 128

页数：6

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