CHARACTERISATION OF TiO2 THIN FILMS PREPARED BY CHEMICAL BATH DEPOSITION

被引：2
作者：
Elfanaoui, Abdeslam [1 ]
Boulkaddat, Lahcen [1 ]
Taleb, Abdelhafed [2 ]
Ihlal, Ahmed [1 ]
Elhamri, Elhoussine [1 ]
Meddah, Mohamed [1 ]
Bouabid, Khalid [1 ]
Portier, Xavier [3 ]
Outzourhit, Abdelkader [4 ]
Laanab, Larbi [5 ]
机构：
[1] Univ Ibn Zohr, Dep Phys, Fac Sci, LMER, Hay Dakhla 80000, Agadir, Morocco
[2] Ecole Natl Super Chim, LECIME, F-75231 Paris 05, France
[3] Univ Caen Basse Normandie, CIMAP, CEA, CNRS,UMR 6252, F-14050 Caen, France
[4] Univ Cadi Ayyad, Fac Sci Semlalia, Lab Phys Solide & Couches Minces, Marrakech 40000, Morocco
[5] Univ Mohammed 5, Fac Sci, Ctr Microscopie, Rabat 10000, Morocco
来源：
ANNALES DE CHIMIE-SCIENCE DES MATERIAUX | 2011年 / 36卷 / 01期
关键词：
ELECTRON-BEAM EVAPORATION; PHOTOCATALYTIC ACTIVITY; VAPOR-DEPOSITION; SOL-GEL; OPTICAL-PROPERTIES; ANATASE;
D O I：
10.3166/acsm.36.37-43
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Nartometer titanium dioxide (TiO2) films were successfully deposited on different substrates, glass and Indium-doped Tin Oxide (ITO), using a chemical bath deposition (CBD) method and annealed at high temperature: 600 degrees C. The structural properties were studied by X-ray diffraction (XRD), Field Emission Gun-scanning electron microscopy (FEG-SEM) and the chemical composition was investigated using energy-dispersive X-ray analysis (EDX). The optical properties of our films were studied using UV-Vis spectrophotometry. The main features of the obtained films consist in firmly adhesive and homogeneous Anatase and Rutile TiO2 films. The optical measurements reveal that the band gap value varies from 2.89 up to 3.11 eV depending strongly on the nature of the substrate.
引用
收藏
页码：37 / 43
页数：7
相关论文
共 29 条
  • [1] Visible-light photocatalysis in nitrogen-doped titanium oxides
    Asahi, R
    Morikawa, T
    Ohwaki, T
    Aoki, K
    Taga, Y
    [J]. SCIENCE, 2001, 293 (5528) : 269 - 271
  • [2] Electrical and optical properties of TiOx thin films deposited by reactive magnetron sputtering
    Banakh, O
    Schmid, PE
    Sanjinés, R
    Lévy, F
    [J]. SURFACE & COATINGS TECHNOLOGY, 2002, 151 : 272 - 275
  • [3] Optical Study of TiO2 Thin Films Prepared by Sol-Gel
    Bouabid, K.
    Ihlal, A.
    Amira, Y.
    Sdaq, A.
    Assabbane, A.
    Ait-Ichou, Y.
    Outzourhit, A.
    Ameziane, E. L.
    Nouet, G.
    [J]. FERROELECTRICS, 2008, 372 : 69 - 75
  • [4] Structure and properties of TiO2 films prepared by ion beam assisted deposition
    Cheng, Xiaoling
    Hu, Shejun
    Zeng, Peng
    Kuang, Tongchun
    Xie, Guangrong
    Gao, Feng
    [J]. SURFACE & COATINGS TECHNOLOGY, 2007, 201 (9-11) : 5552 - 5555
  • [5] Understanding the solar photo-catalytic activity of TiO2-ITO nanocomposite deposited on low cost substrates
    Chorfi, H.
    Zayani, G.
    Saadoun, M.
    Bousselmi, L.
    Bessais, B.
    [J]. APPLIED SURFACE SCIENCE, 2010, 256 (07) : 2170 - 2175
  • [6] Reactive sputter deposition of titanium dioxide
    Dannenberg, R
    Greene, P
    [J]. THIN SOLID FILMS, 2000, 360 (1-2) : 122 - 127
  • [7] Structural, optical and electrical properties of transparent V and Pd-doped TiO2 thin films prepared by sputtering
    Domaradzki, J
    [J]. THIN SOLID FILMS, 2006, 497 (1-2) : 243 - 248
  • [8] Optical and structural properties of TiO2 thin films prepared by sol-gel spin coating
    Elfanaoui, A.
    Elhamri, E.
    Boulkaddat, L.
    Ihlal, A.
    Bouabid, K.
    Laanab, L.
    Taleb, A.
    Portier, X.
    [J]. INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2011, 36 (06) : 4130 - 4133
  • [9] Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films
    Hasan, M. M.
    Haseeb, A. S. M. A.
    Saidur, R.
    Masjuki, H. H.
    Hamdi, M.
    [J]. OPTICAL MATERIALS, 2010, 32 (06) : 690 - 695
  • [10] CHEMICAL VAPOR-DEPOSITION OF TRANSPARENT ELECTRICALLY CONDUCTING LAYERS OF INDIUM OXIDE DOPED WITH TIN
    KANE, J
    SCHWEIZER, HP
    KERN, W
    [J]. THIN SOLID FILMS, 1975, 29 (01) : 155 - 163
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