Low-Power Vertical Tunnel Field-Effect Transistor Ternary Inverter

被引:20
作者
Kim, Hyun Woo [1 ]
Kwon, Daewoong [2 ,3 ,4 ]
机构
[1] Seoul Natl Univ, Dept Elect & Comp Engn, Seoul 08826, South Korea
[2] Seoul Natl Univ, Inter Univ Semicond Res Ctr, Seoul 08826, South Korea
[3] Inha Univ, Dept Elect Engn, Incheon 22212, South Korea
[4] Inha Univ, Convergence Ctr 3D, Incheon 22212, South Korea
基金
新加坡国家研究基金会;
关键词
Band-to-band tunneling (BTBT); vertical tunnel field-effect transistor (vertical tunnel FET); ternary inverter; subthreshold swing (SS); ternary CMOS (T-CMOS); line tunneling;
D O I
10.1109/JEDS.2021.3057456
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, vertical tunnel FET-based ternary CMOS (T-CMOS) is introduced and its electrical characteristics are investigated using TCAD device and mixed-mode simulations with experimentally calibrated tunneling parameters. This new T-CMOS utilizes two different types of tunneling currents to form three different output voltage states: (1) source-to-drain tunneling current; and (2) conventional source-to-channel tunneling current. To form a half supply voltage (VDD) output voltage during the inverter operation, the n-/p-type devices of the proposed T-CMOS are designed to have constant source-to-drain tunneling current regardless of gate voltage (VGS) by using nitride spacer between gate and drain. Also, typical binary inverter operation is performed using the source-to-channel tunneling. In voltage transfer characteristics (VTC), it is confirmed that there is the clear half VDD state after matching the tunneling currents of the n-/p-type devices. It is revealed that the stable half VDD state cannot be achievable if the currents are mismatched by gate workfunction, gate dielectric thickness, and interface trap variations, implying that the current matching between n-/p-type devices is crucial to obtain stable ternary operations.
引用
收藏
页码:286 / 294
页数:9
相关论文
共 37 条
[1]   In-Built N+ Pocket p-n-p-n Tunnel Field-Effect Transistor [J].
Abdi, Dawit Burusie ;
Kumar, Mamidala Jagadesh .
IEEE ELECTRON DEVICE LETTERS, 2014, 35 (12) :1170-1172
[2]   30-nm Tunnel FET With Improved Performance and Reduced Ambipolar Current [J].
Anghel, Costin ;
Hraziia ;
Gupta, Anju ;
Amara, Amara ;
Vladimirescu, Andrei .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (06) :1649-1654
[3]   A Tunnel FET for VDD Scaling Below 0.6 V With a CMOS-Comparable Performance [J].
Asra, Ram ;
Shrivastava, Mayank ;
Murali, Kota V. R. M. ;
Pandey, Rajan K. ;
Gossner, Harald ;
Rao, V. Ramgopal .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (07) :1855-1863
[4]   Double-gate tunnel FET with high-κ gate dielectric [J].
Boucart, Kathy ;
Mihai Ionescu, Adrian .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2007, 54 (07) :1725-1733
[5]   Tunneling field-effect transistors (TFETs) with subthreshold swing (SS) less than 60 mV/dec [J].
Choi, Woo Young ;
Park, Byung-Gook ;
Lee, Jong Duk ;
Liu, Tsu-Jae King .
IEEE ELECTRON DEVICE LETTERS, 2007, 28 (08) :743-745
[6]   Hetero-Gate-Dielectric Tunneling Field-Effect Transistors [J].
Choi, Woo Young ;
Lee, Woojun .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (09) :2317-2319
[7]   Device scaling limits of Si MOSFETs and their application dependencies [J].
Frank, DJ ;
Dennard, RH ;
Nowak, E ;
Solomon, PM ;
Taur, Y ;
Wong, HSP .
PROCEEDINGS OF THE IEEE, 2001, 89 (03) :259-288
[8]   Junctionless Tunnel Field Effect Transistor [J].
Ghosh, Bahniman ;
Akram, Mohammad Waseem .
IEEE ELECTRON DEVICE LETTERS, 2013, 34 (05) :584-586
[9]   SPIKING NEURAL NETWORKS [J].
Ghosh-Dastidar, Samanwoy ;
Adeli, Hojjat .
INTERNATIONAL JOURNAL OF NEURAL SYSTEMS, 2009, 19 (04) :295-308
[10]   Impact ionization MOS (I-MOS) - Part I: Device and circuit simulations [J].
Gopalakrishnan, K ;
Griffin, PB ;
Plummer, JD .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2005, 52 (01) :69-76