Hardness of bulk single-crystal GaN and AlN

被引:0
|
作者
Yonenaga, I [1 ]
机构
[1] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 980, Japan
来源
MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH | 2002年 / 7卷 / 06期
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The hardness of single-crystal GaN and AlN of 0.5-mm-thickness was measured by the Vickers indentation method in the temperature range 20 - 1400degreesC. The hardness of GaN and AlN is 10.2 and 17.7 GPa, respectively, at room temperature. The nano-indentation hardness of single-crystal AlN was measured at room temperature as 18 GPa, harder than GaN and InN. Up to about 1100degreesC, GaN and AlN maintain its hardness similar to that of Sic and thus, a high mechanical stability for GaN and AlN at elevated temperatures is deduced. Yield strength of nitrides is discussed.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Hardness of bulk single-crystal GaN and AlN
    Yonenaga, Ichiro
    MRS Internet Journal of Nitride Semiconductor Research, 2002, 7
  • [2] High-temperature hardness of bulk single-crystal AlN
    Yonenaga, Ichiro
    Nikolaev, Andrey
    Melnik, Yuriy
    Dmitriev, Vladimir
    Japanese Journal of Applied Physics, Part 2: Letters, 2001, 40 (5 A):
  • [3] High-temperature hardness of bulk single-crystal AlN
    Yonenaga, I
    Nikolaev, A
    Melnik, Y
    Dmitriev, V
    GAN AND RELATED ALLOYS-2001, 2002, 693 : 609 - 613
  • [4] Photoluminescence of GaN deposited on single-crystal bulk AlN with different polarities
    Tamulaitis, G
    Yilmaz, I
    Shur, MS
    Gaska, R
    Chen, C
    Yang, J
    Kuokstis, E
    Khan, A
    Schujman, SB
    Schowalter, LJ
    APPLIED PHYSICS LETTERS, 2003, 83 (17) : 3507 - 3509
  • [5] Nano-indentation hardness and elastic moduli of bulk single-crystal AlN
    Yonenaga, Ichiro
    Shima, Toshiyuki
    Sluiter, Marcel H.F.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (7 A): : 4620 - 4621
  • [6] Nano-indentation hardness and elastic moduli of bulk single-crystal AlN
    Yonenaga, I
    Shima, T
    Sluiter, MHF
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (7A): : 4620 - 4621
  • [7] AlGaN/GaN heterostructure field-effect transistors on single-crystal bulk AlN
    Hu, X
    Deng, J
    Pala, N
    Gaska, R
    Shur, MS
    Chen, CQ
    Yang, J
    Simin, G
    Khan, MA
    Rojo, JC
    Schowalter, LJ
    APPLIED PHYSICS LETTERS, 2003, 82 (08) : 1299 - 1301
  • [8] Single-crystal GaN/AlN layers on CVD diamond
    Khrykin, O. I.
    Drozdov, Yu. N.
    Drozdov, M. N.
    Yunin, P. A.
    Shashkin, V. I.
    Bogdanov, S. A.
    Muchnikov, A. B.
    Vikharev, A. L.
    Radishev, D. B.
    TECHNICAL PHYSICS LETTERS, 2015, 41 (10) : 954 - 956
  • [9] Single-crystal GaN/AlN layers on CVD diamond
    O. I. Khrykin
    Yu. N. Drozdov
    M. N. Drozdov
    P. A. Yunin
    V. I. Shashkin
    S. A. Bogdanov
    A. B. Muchnikov
    A. L. Vikharev
    D. B. Radishev
    Technical Physics Letters, 2015, 41 : 954 - 956
  • [10] High temperature hardness of bulk single crystal GaN
    Yonenaga, I
    Hoshi, T
    Usui, A
    MRS INTERNET JOURNAL OF NITRIDE SEMICONDUCTOR RESEARCH, 2000, 5 : art. no. - W3.90