Dual-gate induced InP nanowire diode

被引:1
作者
Storm, Kristian [1 ]
Nylund, Gustav [1 ]
Borgstrom, Magnus [1 ]
Wallentin, Jesper [1 ]
Fasth, Carina [1 ]
Thelander, Claes [1 ]
Samuelson, Lars [1 ]
机构
[1] Lund Univ, Nanometer Struct Consortium, S-22100 Lund, Sweden
来源
PHYSICS OF SEMICONDUCTORS: 30TH INTERNATIONAL CONFERENCE ON THE PHYSICS OF SEMICONDUCTORS | 2011年 / 1399卷
关键词
nanowire; InP; wrap-gate; Fermi level tuning; GROWTH; ARRAYS;
D O I
10.1063/1.3666362
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Semiconductor devices are heavily dependent on dopant incorporation in order to control the electrical properties. In this paper we investigate the possibility of using gates wrapped around a nanowire (NW) channel as a way of tuning the Fermi level position, in certain cases removing the need for dopants and providing a more dynamical way of setting the device properties. InP NW devices with omega gates are fabricated, and a p-n junction is formed in a nominally intrinsic NW channel. In order to further increase the electrostatic control of the channel and other device properties, vertical devices are discussed as a promising way of implementing this type of device.
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页数:2
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