Evaluation of imprint property of (111)-highly oriented lead zirconate titanate (PZT)-base ferroelectric material

被引:4
作者
Hamada, Y [1 ]
Kijima, T [1 ]
Miyazawa, H [1 ]
Shimoda, T [1 ]
机构
[1] SEIKO EPSON CORP, Technol Platform Res Ctr, Nagano 3990293, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 9B期
关键词
ferroelectric; FeRAM; imprint; PZT; PZTN; leakage current; diode;
D O I
10.1143/JJAP.44.6895
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the mechanism of static imprint failure in (111)-highly oriented lead zirconate fitanate (PZT)-base ferroelectric material by examining the change in the leakage current density. We prepared Pt/Pb(Zr,Ti,Nb)O-3 (PZTN)/Pt capacitors. Our capacitors passed the static imprint test at 150 degrees C for 1280 h with a write/read voltage of 3 V or higher. After the static imprint test we measured the leakage current densities of capacitors. All capacitors showed an increase in leakage current density on one side and a decrease on the other side. The side on which leakage current increased depended on the voltage polarity of the write pulse. The changes in leakage current density of capacitors with various write/read voltages indicate that static imprint failure has at least two mechanisms, the contributions of which change according to the write/read voltage. When the write/read voltage is lower, capacitors show diode-like behavior after static imprinting.
引用
收藏
页码:6895 / 6899
页数:5
相关论文
共 16 条
[1]   The interface screening model as origin of imprint in PbZrxTi1-xO3 thin films.: I.: Dopant, illumination, and bias dependence [J].
Grossmann, M ;
Lohse, O ;
Bolten, D ;
Boettger, U ;
Schneller, T ;
Waser, R .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (05) :2680-2687
[2]  
Grossmann M, 2001, INTEGR FERROELECTR, V37, P535, DOI 10.1080/10584580108015679
[3]   The interface screening model as origin of imprint in PbZrxTi1-xO3 thin films.: II.: Numerical simulation and verification [J].
Grossmann, M ;
Lohse, O ;
Bolten, D ;
Boettger, U ;
Waser, R .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (05) :2688-2696
[4]  
Grossmann M., 1998, Integrated Ferroelectrics, V22, P95, DOI 10.1080/10584589808208033
[5]   Lifetime estimation due to imprint failure in ferroelectric SrBi2Ta2O9 thin films [J].
Grossmann, M ;
Lohse, O ;
Bolten, D ;
Boettger, U ;
Waser, R ;
Hartner, W ;
Kastner, M ;
Schindler, G .
APPLIED PHYSICS LETTERS, 2000, 76 (03) :363-365
[6]   Novel Si codoped Pb(Zr,Ti,Nb)O3 thin film for high-density ferroelectric random access memory [J].
Kijima, T ;
Aoyama, T ;
Miyazawa, H ;
Hamada, Y ;
Ohashi, K ;
Nakayama, M ;
Natori, E ;
Shimoda, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (1A) :267-274
[7]   Imprint of oriented Pb(Zr, Ti)O3 thin films with oxygen atmosphere in cooling process [J].
Lee, HS ;
Auh, KH ;
Jeon, MS ;
Um, WS ;
Lee, IS ;
Choi, GP ;
Kim, HG .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (10) :5630-5633
[8]  
MIYAZAWA H, UNPUB JPN J APPL PHY
[9]   Ferroelectric properties of Pb(Zi, Ti)O3 capacitor with thin SrRuO3 films within both electrodes [J].
Morimoto, T ;
Hidaka, O ;
Yamakawa, K ;
Arisumi, O ;
Kanaya, H ;
Iwamoto, T ;
Kumura, Y ;
Kunishima, I ;
Tanaka, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (4B) :2110-2113
[10]   Imprint model based on thermionic electron emission under local fields in ferroelectric thin films [J].
Nagasawa, D ;
Nozawa, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (9B) :5406-5410