ITO thin films deposited by RTE on flexible transparent substrate

被引：0
|
作者：
de Carvalho, CN
Luis, A
Lavareda, G
Amaral, A
Brogueira, P
Godinho, MH
机构：
[1] Univ Nova Lisboa, Fac Ciencias & Tehnol, Dept Ciencias Mat, P-2825114 Caparica, Portugal
[2] IST, Ctr Fis Mol, P-1049001 Lisbon, Portugal
[3] IST, Dept Fis, P-1049001 Lisbon, Portugal
来源：
OPTICAL MATERIALS | 2001年 / 17卷 / 1-2期
关键词：
indium tin oxide (ITO); reactive thermal evaporation (RTE); cellulose derivative substrates; oxygen plasma; transmittance; atomic force microscopy (AFM);
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Indium-tin oxide (ITO) thin films were successfully deposited onto transparent flexible substrates of hydroxypropylcellulose (HPC) cross-linked with 1,4-di-isocyanatobutane (BDI), The effect of O-2 plasma exposure on the transmittance and sheet resistance of the ITO coated flexible substrates has been studied. Atomic force microscopy (AFM) shows that these type of substrates have a large surface roughness (4.8 nm) which originates high values in the diffuse transmittance. The best properties of the resulting ITO films on flexible substrates are an average total transmittance in the visible region of about 80% and a sheet resistance of about 4 x 10(4) Omega /sq. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：287 / 290
页数：4
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