Crossover in the scaling behavior of ion-sputtered Pd(001)

被引:0
|
作者
Kim, T. C. [1 ]
Kim, Y. [1 ]
Noh, D. Y. [1 ]
Kahng, B. [2 ]
Kim, J. -S. [3 ]
机构
[1] GIST, Dept Mat Sci & Engn, Kwangju 500712, South Korea
[2] Seoul Natl Univ, Sch Phys & Ctr Theort Phys, Seoul 151747, South Korea
[3] Sook Myung Women Univ, Dept Phys, Seoul 140742, South Korea
关键词
x-ray reflectivity; ion-sputtering; scaling theory;
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We investigate morphological evolution of Ar+ ion sputtered Pd(001) by in situ real-time x-ray reflectivity and grazing incidence small angle x-ray scattering (GISAXS) experiments. Surface roughness W, and its dynamic scaling behavior show a definite crossover across a crossover time t(c). Before t(c), growth exponent beta, varies from 0.20 to 0.49 depending on substrate temperature, T. After t(c), beta drops to similar to 0.1, irrespective to substrate temperature. Satellite peaks in GISAXS indicating laterally ordered structure develop as the growth time approaches t(c), which become clear with further sputtering. We think that the crossover behavior near t(c) indicates the reduction of non-linear effect and the scaling behavior would follow the Edwards-Wilkinson model.
引用
收藏
页码:1603 / +
页数:2
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