Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditions

被引：23

作者：

Mazur, Michal ^{[1
]}

Howind, Torsten ^{[2
]}

Gibson, Des ^{[2
]}

Kaczmarek, Danuta ^{[1
]}

Morgiel, Jerzy ^{[3
]}

Wojcieszak, Damian ^{[1
]}

Zhu, Wenzhong ^{[2
]}

Mazur, Piotr ^{[4
]}

机构：

[1] Wroclaw Univ Technol, Fac Microsyst Elect & Photon, Janiszewskiego 11-17, PL-50372 Wroclaw, Poland

[2] Univ West Scotland, Scottish Univ Phys Alliance, Inst Thin Films Sensors & Imaging, High St, Paisley PA1 2BE, Renfrew, Scotland

[3] Polish Acad Sci, Inst Met & Mat Sci, Reymonta 25, PL-30059 Cracov, Poland

[4] Univ Wroclaw, Inst Expt Phys, Max Born 9, PL-50204 Wroclaw, Poland

来源：

SURFACE & COATINGS TECHNOLOGY | 2017年 / 320卷

关键词：

HfO2; Thin films; Magnetron sputtering; Microstructure; Optical properties; Mechanical properties; OPTICAL-PROPERTIES; MICROSTRUCTURE;

D O I：

10.1016/j.surfcoat.2016.12.001

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this work, properties of hafnium dioxide (HfO2) thin films deposited by magnetron sputtering with different powers (i.e. 200 W, 400 W and 600 W) were described. Based on microstructure measurements obtained by X-ray diffraction, Raman scattering and transmission electron microscopy method it was observed that there is a significant influence of the sputtering power on investigated properties of HfO2 thin films. Increase of the sputtering power caused, e.g. an increase of average crystallite size and surface roughness. Microstructure of thin films deposited with lower power was composed from a large number of voids that resulted in significant changes of their optical and mechanical properties. Results of optical studies showed that all deposited thin films were well transparent in a visible light range. Refractive index increased gradually with an increase of deposition power from 1.86 (200 W) to 2.09 (600 W). Performed investigations of mechanical properties revealed that hardness and Young's elastic modulus of HfO2 thin films increased with an increase of the sputtering power. (C) 2016 Elsevier B.V. All rights reserved.

引用

页码：426 / 431

页数：6

共 50 条

[41] EFFECTS OF ANNEALING ON THE PHYSICAL PROPERTIES OF ITO THIN FILMS GROWN BY RADIO FREQUENCY MAGNETRON SPUTTERING [J].

Radu, A. ;

Locovei, C. ;

Antohe, V. A. ;

Socol, M. ;

Coman, D. ;

Manica, M. ;

Dumitru, A. ;

Dan, L. ;

Radu, C. ;

Raduta, A. M. ;

Ion, L. ;

Iftimie, S. ;

Antohe, S. .

DIGEST JOURNAL OF NANOMATERIALS AND BIOSTRUCTURES, 2020, 15 (03) :679-687

[42] Optical characterization of HfO2 thin films [J].

Franta, Daniel ;

Ohlidal, Ivan ;

Necas, David ;

Vizda, Frantisek ;

Caha, Ondrej ;

Hason, Martin ;

Pokorny, Pavel .

THIN SOLID FILMS, 2011, 519 (18) :6085-6091

[43] STRUCTURAL, ELECTRICAL AND OPTICAL PROPERTIES OF CuO THIN FILMS OBTAINED BY REACTIVE MAGNETRON SPUTTERING [J].

Kuryshchuk, S., I ;

Kovalyuk, T. T. ;

Parkhomenko, H. P. ;

Solovan, M. M. .

EAST EUROPEAN JOURNAL OF PHYSICS, 2021, (04) :76-85

[44] Thermoelectric Properties of Thin Films of Germanium-Gold Alloy Obtained by Magnetron Sputtering [J].

Nowak, Damian ;

Turkiewicz, Marta ;

Solnica, Natalia .

COATINGS, 2019, 9 (02)

[45] Optical properties of thin Ag films deposited by magnetron sputtering [J].

Charton, C ;

Fahland, M .

SURFACE & COATINGS TECHNOLOGY, 2003, 174 :181-186

[46] Structural, mechanical and tribological properties of ZrC thin films deposited by magnetron sputtering [J].

Gilewicz, Adam ;

Mydlowska, Katarzyna ;

Ratajski, Jerzy ;

Szparaga, Lukasz ;

Bartosik, Przemyslaw ;

Kochmanski, Pawel ;

Jedrzejewski, Roman .

VACUUM, 2019, 169

[47] Effect of Bias Voltage on Substrate for the Structure and Electrical Properties of Y:HfO2 Thin Films Deposited by Reactive Magnetron Co-Sputtering [J].

Zhang, Weiqi ;

Zhou, Dayu ;

Sun, Nana ;

Wang, Jingjing ;

Li, Shuaidong .

ADVANCED ELECTRONIC MATERIALS, 2021, 7 (10)

[48] Influence of the Initial Zinc Nanolayers Obtained by Magnetron Sputtering on the Properties of Thin Zinc Oxide Films Synthesized on Their Basis by Thermal Oxidation [J].

Tomaev, V. V. ;

Polishchuk, V. A. ;

Leonov, N. B. .

GLASS PHYSICS AND CHEMISTRY, 2025, 51 (01) :125-132

[49] Impact of lanthanum on the modification of HfO2 films structure [J].

Smirnova, T. P. ;

Yakovkina, L. V. ;

Borisov, V. O. .

JOURNAL OF RARE EARTHS, 2015, 33 (08) :857-862

[50] Growth, microstructure and electrical properties of sputter-deposited hafnium oxide (HfO2) thin films grown using a HfO2 ceramic target [J].

Aguirre, B. ;

Vemuri, R. S. ;

Zubia, D. ;

Engelhard, M. H. ;

Shutthananadan, V. ;

Bharathi, K. Kamala ;

Ramana, C. V. .

APPLIED SURFACE SCIENCE, 2011, 257 (06) :2197-2202

← 1 2 3 4 5 →