Synthesis of Vertically Oriented Graphene Sheets or Carbon Nanowalls-Review and Challenges

被引:34
作者
Vesel, Alenka [1 ]
Zaplotnik, Rok [1 ]
Primc, Gregor [1 ]
Mozetic, Miran [1 ]
机构
[1] Jozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, Slovenia
关键词
carbon nanowalls; plasma synthesis; growth mechanism; deposition speed; deposition parameters; deposition temperature; CHEMICAL-VAPOR-DEPOSITION; ELECTRON FIELD-EMISSION; CONTROLLABLE GROWTH; PLASMA; NANOSHEETS; TEMPERATURE; DISCHARGE; SILICON; SURFACE; FILMS;
D O I
10.3390/ma12182968
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The paper presents a review on the current methods for deposition of vertically oriented multilayer graphene sheets (often called carbon nanowalls-CNWs) on solid substrates. Thin films of CNWs are among the most promising materials for future applications in capacitors, batteries, electrochemical devices, and photovoltaics, but their application is currently limited by slow deposition rates and difficulties in providing materials of a desired structure and morphology. The review paper analyzes results obtained by various groups and draws correlations between the reported experimental conditions and obtained results. Challenges in this scientific field are presented and technological problems stressed. The key scientific challenge is providing the growth rate as well as morphological and structural properties of CNWs thin films versus plasma parameters, in particular versus the fluxes of reactive plasma species onto the substrate surface. The technological challenge is upgrading of deposition techniques to large surfaces and fast deposition rates, and development of a system for deposition of CNWs in the continuous mode.
引用
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页数:17
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