Apparatus to measure electron reflection

被引：0

作者：

Maldonado, Juan R. ^{[1
]}

Sun, Yun ^{[2
]}

Tsai, Roger ^{[3
]}

Pease, Fabian ^{[1
]}

Pianetta, Piero ^{[2
]}

机构：

[1] Stanford Univ, Stanford, CA 94305 USA

[2] SLAC, Menlo Pk, CA USA

[3] KLA Tencor, Milpitas, CA 95035 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2009年 / 27卷 / 06期

关键词：

electron beam lithography; electron optics; photocathodes;

D O I：

10.1116/1.3242695

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Controlling reflection of electrons from an array of electrodes is a key feature of an electron lithography system currently under development. Here the authors describe a technique for characterizing this control. The apparatus is only 30 mm long, features simple colinear electron optics and a photocathode that emits a well-directed, monochromatic beam. The overall energy resolution is better than 1 eV.

引用

页码：2644 / 2647

页数：4

共 4 条

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