Spin transistor based on double tunnel junctions using half-metallic Co2MnSi electrodes

被引:6
|
作者
Ohdaira, Yusuke [1 ]
Oogane, Mikihiko [1 ]
Naganuma, Hiroshi [1 ]
Ando, Yasuo [1 ]
机构
[1] Tohoku Univ, Grad Sch Engn, Dept Appl Phys, Sendai, Miyagi 9808579, Japan
来源
INTERNATIONAL CONFERENCE ON MAGNETISM (ICM 2009) | 2010年 / 200卷
关键词
D O I
10.1088/1742-6596/200/5/052019
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnetic tunnel junctions (MTJs) using half-metallic Heusler alloy Co2MnSi electrodes show large tunnel magnetoresistance (TMR) ratio and large bias voltage dependence of tunnel conductance. We propose a spin transistor utilizing half-metallic characteristics of Co2MnSi. Fundamental structure is double tunnel junctions using Co2MnSi electrodes with gate electrode. The bias voltage dependence of tunnel conductance for the fabricated device has shown half-metallic characteristic of Co2MnSi electrodes. The TMR ratio has decreased with increasing gate voltage. This is the first observation of modulating the tunnel conductance by applying an external voltage in spin transistor using Co2MnSi.
引用
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页数:4
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