Effect of Aluminium Doping on Structural and Optoelectronic Properties of Sol-Gel Derived Nanocrystalline ZnO Thin Film

被引:18
作者
Chakravarty, Runa [2 ]
Periasamy, C. [1 ]
机构
[1] Banaras Hindu Univ, Inst Technol, Microelect Res Ctr, Dept Elect Engn, Varanasi 221005, Uttar Pradesh, India
[2] Kashi Inst Technol, Dept Appl Sci, Varanasi 221307, Uttar Pradesh, India
关键词
ZnO Thin Film; Al-Doped ZnO Films; Sol-Gel Technique; Surface Morphology; Optical Bandgap; ZINC-OXIDE FILMS; ELECTRICAL-PROPERTIES; GROWTH; TEMPERATURE; SUBSTRATE; POSTTREATMENT; FABRICATION;
D O I
10.1166/sam.2011.1154
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Highly transparent sol gel derived conducting Al-doped nanocrystalline ZnO (AZO) thin films have been prepared on glass substrates by spin coating technique. The effect of Al doping on the structural, optical and electrical properties of these films were investigated. X-ray diffraction patterns confirm that undoped ZnO and AZO films were polycrystalline with hexagonal wurtzite structure. Both XRD and SEM results show that there is a decrease of the grain size with increasing Al concentration in ZnO. Atomic force micrographs indicate much smaller surface roughness of the film showing significantly smooth surfaces. The optical energy bandgap was found to vary from 3.28 to 3.54 eV by changing the Al content from 0 to 3%. This shift is partly due to Burstein-Moss shift and partly due to compressive strain induced in film due to Al doping. The minimum resistivity of 5.79 x 10(-4) Omega cm was obtained for the film doped with 2 wt% Al. The study suggests that Al-doped ZnO is a promising material for using as electrode in photovoltaic solar cells and flat panel displays.
引用
收藏
页码:276 / 283
页数:8
相关论文
共 36 条
  • [1] Armelao L, 2001, THIN SOLID FILMS, V394, P90, DOI 10.1016/S0040-6090(01)01158-0
  • [2] Electron irradiation effects on electrical and optical properties of sol-gel prepared ZnO films
    Bhat, J. S.
    Patil, A. S.
    Swami, N.
    Mulimani, B. G.
    Gayathri, B. R.
    Deshpande, N. G.
    Kim, G. H.
    Seo, M. S.
    Lee, Y. P.
    [J]. JOURNAL OF APPLIED PHYSICS, 2010, 108 (04)
  • [3] ANOMALOUS OPTICAL ABSORPTION LIMIT IN INSB
    BURSTEIN, E
    [J]. PHYSICAL REVIEW, 1954, 93 (03): : 632 - 633
  • [4] Bidirectional direct-current electroluminescence from i-MgxZn1-xO/n-ZnO/SiOx double-barrier heterostructures on Si
    Chen, Peiliang
    Ma, Xiangyang
    Li, Dongsheng
    Zhang, Yuanyuan
    Yang, Deren
    [J]. APPLIED PHYSICS LETTERS, 2009, 94 (06)
  • [5] Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition
    Chen, X
    Guan, WJ
    Fang, GJ
    Zhao, XZ
    [J]. APPLIED SURFACE SCIENCE, 2005, 252 (05) : 1561 - 1567
  • [6] Das R, 2004, INDIAN J PHYS, V78, P901
  • [7] Ga-doping effects on electrical and luminescent properties of ZnO:(La,Eu)OF red phosphor thin films
    Fujihara, S
    Suzuki, A
    Kimura, T
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 94 (04) : 2411 - 2416
  • [8] Properties of Al-doped ZnO thin films deposited by a chemical spray process
    Gomez, H.
    Maldonado, A.
    Castanedo-Perez, R.
    Torres-Delgado, G.
    Olvera, M. de la L.
    [J]. MATERIALS CHARACTERIZATION, 2007, 58 (8-9) : 708 - 714
  • [9] Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering
    Hong, RJ
    Jiang, X
    Szyszka, B
    Sittinger, V
    Pflug, A
    [J]. APPLIED SURFACE SCIENCE, 2003, 207 (1-4) : 341 - 350
  • [10] Synthesis and conductivity enhancement of Al-doped ZnO nanorod array thin films
    Hsu, Chih-Hsiung
    Chen, Dong-Hwang
    [J]. NANOTECHNOLOGY, 2010, 21 (28)