Infrared properties of room-temperature-deposited ZrO2

被引：22

作者：

Koltunski, L

Devine, RAB

机构：

[1] Univ New Mexico, Ctr High Technol Mat, Albuquerque, NM 87106 USA

[2] USAF, Res Labs, Space Vehicle Directorate, Kirtland AFB, NM 87117 USA

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 03期

关键词：

D O I：

10.1063/1.1384476

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

ZrO2 films have been deposited at room temperature using Zr(OC4H9)(4) and O-2 source gases in a low-pressure electron-cyclotron-resonance-excited plasma reactor. The deposited films were, in general, mixed (amorphous and polycrystalline; monoclinic or tetragonal), the crystallinity depending upon the substrate polarization during deposition and the postdeposition annealing. Infrared vibrational modes of the films have been characterized. In as-deposited films, the dielectric constants were similar to 12-18, dependent upon sample bias during deposition, and the refractive indices were similar to1.85-1.92. (C) 2001 American Institute of Physics.

引用

页码：320 / 322

页数：3

共 11 条

[1] Zirconia coatings realized by microwave plasma-enhanced chemical vapor deposition [J].