Phase composition at surface of Fe-3%Si alloy

被引：2
作者：
Schneeweiss, O
Vondrácek, M
Cháb, V
Lejcek, P
Prince, KC
机构：
[1] Acad Sci Czech Republ, Inst Phys Mat, CZ-61662 Brno, Czech Republic
[2] Acad Sci Czech Republ, Inst Phys, CZ-18221 Prague, Czech Republic
[3] Sincrotrone Trieste, I-34012 Trieste, Italy
来源：
CZECHOSLOVAK JOURNAL OF PHYSICS | 2005年 / 55卷 / 07期
关键词：
Mossbauer spectroscopy; XPS; synchrotron radiation;
D O I：
10.1007/s10582-005-0089-8
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The structure, phase and chemical compositions of surface layers in different depths of Fe-3%Si alloy were investigated. According to the X-ray Photoelectron Spectroscopy (XPS) spectrum (penetration depth of up to approximate to 1 nm) of the as-prepared sample, a layer Of SiO2 was present on the top. After the subsequent Ar+ sputtering (removing the SiO2 layer), a segregation of Si atoms and two other phases were observed. The phases were described as the cubic c-FeSi and Fe3Si. The emission Fe-57 Mossbauer spectra confirmed a presence of these phases. The alpha-Fe and solid solution of alpha-Fe + 1wt.%Si were recognized in the Conversion Electron Mossbauer spectra (penetration depth approximate to 300 nm) while the Mossbauer spectra taken in scattering geometry with detection of 14.4 keV gamma radiation (scanning depth of approximate to 30 mu m) indicate Fe-3wt. %Si solid solution as a main phase.
引用
收藏
页码：875 / 882
页数：8
相关论文
共 23 条
[1]   INITIAL-STAGES OF THE GROWTH OF FE ON SI(111)7X7 [J].
ALVAREZ, J ;
DEPARGA, ALV ;
HINAREJOS, JJ ;
DELAFIGUERA, J ;
MICHEL, EG ;
OCAL, C ;
MIRANDA, R .
PHYSICAL REVIEW B, 1993, 47 (23) :16048-16051
[2]   ELECTRONIC-STRUCTURE OF IRON SILICIDES GROWN ON SI(100) DETERMINED BY PHOTOELECTRON SPECTROSCOPIES [J].
ALVAREZ, J ;
HINAREJOS, JJ ;
MICHEL, EG ;
CASTRO, GR ;
MIRANDA, R .
PHYSICAL REVIEW B, 1992, 45 (24) :14042-14051
[3]   A CLARIFICATION OF THE INDEX OF REFRACTION OF BETA-IRON DISILICIDE [J].
BOST, MC ;
MAHAN, JE .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (04) :2034-2037
[4]   CO ADSORPTION ON AN ORDERED FE3SI(100) SINGLE-CRYSTAL SURFACE [J].
BUSSE, H ;
ELTESTER, B ;
KANDLER, J ;
CASTRO, GR ;
WANDELT, K .
SURFACE SCIENCE, 1995, 331 :685-690
[5]   Metastable iron silicide phase stabilized by surface segregation on Fe3Si(100) [J].
Busse, H ;
Kandler, J ;
Eltester, B ;
Wandelt, K ;
Castro, GR ;
Hinarejos, JJ ;
Segovia, P ;
Chrost, J ;
Michel, EG ;
Miranda, R .
SURFACE SCIENCE, 1997, 381 (2-3) :133-141
[6]  
CHERIEF N, 1989, APPL SURF SCI, V41, P245
[7]   BONDING STATE OF SILICON SEGREGATED TO ALPHA-IRON SURFACES AND ON IRON SILICIDE SURFACES STUDIED BY ELECTRON-SPECTROSCOPY [J].
EGERT, B ;
PANZNER, G .
PHYSICAL REVIEW B, 1984, 29 (04) :2091-2101
[8]   Mossbauer investigation of silicide phases at the reactive Fe/Si interface [J].
Fanciulli, M ;
Zenkevich, A ;
Weyer, G .
APPLIED SURFACE SCIENCE, 1998, 123 :207-212
[9]   METALLIZATION-INDUCED SPONTANEOUS SILICIDE FORMATION AT ROOM-TEMPERATURE - THE FE/SI CASE [J].
GALLEGO, JM ;
GARCIA, JM ;
ALVAREZ, J ;
MIRANDA, R .
PHYSICAL REVIEW B, 1992, 46 (20) :13339-13344
[10]   GROWTH OF EPITAXIAL IRON DISILICIDE ON SI(100) [J].
GALLEGO, JM ;
GARCIA, JM ;
ORTEGA, JE ;
DEPARGA, ALV ;
DELAFIGUERA, J ;
OCAL, C ;
MIRANDA, R .
SURFACE SCIENCE, 1992, 269 :1016-1021
123