Hall Effect and Resistivity in Epitaxial MnSi Thin Films Under Ambient and High Pressure

被引：3

作者：

Menzel, D. ^{[1
]}

Schroeter, D. ^{[1
]}

Steinki, N. ^{[1
]}

Suellow, S. ^{[1
]}

Scarioni, A. Fernandez ^{[2
]}

Schumacher, H. W. ^{[2
]}

Okuyama, H. ^{[3
]}

Hidaka, H. ^{[3
]}

Amitsuka, H. ^{[3
]}

机构：

[1] Tech Univ Carolo Wilhelmina Braunschweig, Inst Phys Kondensierten Mat, D-38106 Braunschweig, Germany

[2] Phys Tech Bundesanstalt, D-38116 Braunschweig, Germany

[3] Hokkaido Univ, Grad Sch Sci, Sapporo, Hokkaido 0600808, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2019年 / 55卷 / 02期

关键词：

Hall effect; hydrostatic pressure; magnetoresistance; skyrmions;

D O I：

10.1109/TMAG.2018.2864095

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin film MnSi has been epitaxially grown on Si(111) substrate and investigated in terms of magnetoresistance and Hall measurements under applied hydrostatic pressure up to 2.58 GPa. Although the behavior of the thin films is qualitatively similar to bulk material, at a high pressure above 2 GPa, an additional magnetic ordering occurs, resulting in a reduction of the potential scattering by spin fluctuations. This ordering is stabilized at the applied pressure showing visible effects in the magnetotransport data. Comparing the behavior of thin films with the bulk material under pressure, it seems quite likely that this additional ordering is of skyrmionic nature, which has as yet not been unambiguously evidenced in epitaxial B20 thin films on a substrate under ambient pressure.

引用

页数：4

共 25 条

[1] Stabilization of skyrmion textures by uniaxial distortions in noncentrosymmetric cubic helimagnets [J].

Butenko, A. B. ;

Leonov, A. A. ;

Roessler, U. K. ;

Bogdanov, A. N. .

PHYSICAL REVIEW B, 2010, 82 (05)

[2] A General Method To Measure the Hall Effect in Nanowires: Examples of FeS2 and MnSi [J].

DeGrave, John P. ;

Liang, Dong ;

Jin, Song .

NANO LETTERS, 2013, 13 (06) :2704-2709

[3] Suppressed magnetic order and non-Fermi-liquid behavior in MnSi thin films under hydrostatic pressure [J].

Engelke, J. ;

Menzel, D. ;

Hidaka, H. ;

Seguchi, T. ;

Amitsuka, H. .

PHYSICAL REVIEW B, 2014, 89 (14)

[4] Spin-Spin Correlation Length in MnSi Thin Films [J].

Engelke, Josefin ;

Reimann, Tommy ;

Hoffmann, Lars ;

Gass, Sebastian ;

Menzel, Dirk ;

Suellow, Stefan .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 2012, 81 (12)

[5] RESISTIVE ANOMALIES AT MAGNETIC CRITICAL POINTS [J].

FISHER, ME ;

LANGER, JS .

PHYSICAL REVIEW LETTERS, 1968, 20 (13) :665-&

[6] Skyrmion-Electronics: An Overview and Outlook [J].

Kang, Wang ;

Huang, Yangqi ;

Zhang, Xichao ;

Zhou, Yan ;

Zhao, Weisheng .

PROCEEDINGS OF THE IEEE, 2016, 104 (10) :2040-2061

[7] Structure and magnetic properties of MnSi epitaxial thin films [J].

Karhu, E. ;

Kahwaji, S. ;

Monchesky, T. L. ;

Parsons, C. ;

Robertson, M. D. ;

Maunders, C. .

PHYSICAL REVIEW B, 2010, 82 (18)

[8] Chiral modulations and reorientation effects in MnSi thin films [J].

Karhu, E. A. ;

Roessler, U. K. ;

Bogdanov, A. N. ;

Kahwaji, S. ;

Kirby, B. J. ;

Fritzsche, H. ;

Robertson, M. D. ;

Majkrzak, C. F. ;

Monchesky, T. L. .

PHYSICAL REVIEW B, 2012, 85 (09)

[9] Helical magnetic order in MnSi thin films [J].

Karhu, E. A. ;

Kahwaji, S. ;

Robertson, M. D. ;

Fritzsche, H. ;

Kirby, B. J. ;

Majkrzak, C. F. ;

Monchesky, T. L. .

PHYSICAL REVIEW B, 2011, 84 (06)

[10] Nonmagnetic indenter-type high-pressure cell for magnetic measurements [J].

Kobayashi, T. C. ;

Hidaka, H. ;

Kotegawa, H. ;

Fujiwara, K. ;

Eremets, M. I. .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2007, 78 (02)

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